SCHEMBL2048191

SCHEMBL2048191

C[Si](C)(C)O[Si](c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.39

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.39
ESR2 Q92731 1/20 0.39
NR1H2 P55055 2/20 0.32
NR1H3 Q13133 2/20 0.32
CA4 P22748 1/20 0.32
DUT P33316 1/20 0.32
MAPT P10636 1/20 0.31
LMNA P02545 1/20 0.30
TSHR P16473 1/20 0.30
ALOX12 P18054 1/20 0.30
ACHE P22303 1/20 0.30
GPR3 P46089 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5552262 0.88 ESR1 (0.35) ESR1ESR2
SCHEMBL3154426 0.86 ESR1 (0.34) ESR1ESR2
SCHEMBL94183 0.86 ESR1 (0.34) ESR1ESR2DUT
SCHEMBL93978 0.86 ESR1 (0.34) ESR1ESR2
SCHEMBL3347866 0.86 ESR1 (0.34) ESR1ESR2
SCHEMBL19741576 0.84 ESR1 (0.39) ESR1ESR2NR1H2NR1H3CA4
SCHEMBL13621322 0.84 ESR1 (0.39) ESR1ESR2NR1H2NR1H3CA4
SCHEMBL335769 0.83 TSHR (0.35) ESR1ESR2CA4DUTMAPT
SCHEMBL30002850 0.82 ESR1 (0.38) ESR1ESR2NR1H2NR1H3CA4
SCHEMBL29392326 0.82 ESR1 (0.38) ESR1ESR2NR1H2NR1H3CA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025106343-A1 ETCHING METHODS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2025-05-22 WO claimed
US-20250157825-A1 ETCHING METHODS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2025-05-15 US claimed
US-20240258111-A1 Surface Treatment Compositions and Methods FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2024-08-01 US claimed
CN-111565859-B Surface treatment composition and method 富士胶片电子材料美国有限公司 2022-12-30 CN claimed
US-11447642-B2 Methods of using surface treatment compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2022-09-20 US claimed
US-11174394-B2 Surface treatment compositions and articles containing same FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2021-11-16 US claimed
US-20210122925-A1 METHODS OF USING SURFACE TREATMENT COMPOSITIONS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2021-04-29 US claimed
CN-112513192-A Surface treatment composition and method 富士胶片电子材料美国有限公司 2021-03-16 CN claimed
CN-111565859-A Surface treatment composition and method 富士胶片电子材料美国有限公司 2020-08-21 CN claimed
US-20200035494-A1 Surface Treatment Compositions and Methods FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2020-01-30 US claimed
US-20190211210-A1 SURFACE TREATMENT COMPOSITIONS AND METHODS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2019-07-11 US claimed
EP-3458499-B1 FLAME RETARDANT RESIN COMPOSITION MOMENTIVE PERFORMANCE MAT INC (US) 2026-03-25 EP disclosed
US-20260018421-A1 SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD CENTRAL GLASS CO LTD (JP) 2026-01-15 US disclosed
US-20250343040-A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD CENTRAL GLASS CO LTD (JP) 2025-11-06 US disclosed
WO-2025106343-A1 ETCHING METHODS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2025-05-22 WO disclosed
US-6447913-B1 RESISTANT TO ALKALINE SOLUTIONS FOR A LONG TIME, LOW STRESS, MOLDINGS; BLEND WITH IMPACT RESISTANCE MATERIAL, A SILICONE AND/OR FLUOROPOLYMER, INORGANIC FILLER, AND A POLYFUNCTIONAL EPOXY, ISOCYANATE, OR DIANHYDRIDE COMPOUND POLYPLASTICS CO., LTD (JP) 2002-09-10 US disclosed
US-20020077399-A1 Polyester resin composition POLYPLASTICS CO., LTD. (JP) 2002-06-20 US disclosed
US-6180251-B1 INPACT RESISTANCE AGENT; INORGANIC FILLER; FLAME RETARDANT; AROMATIC POLYVALENT CARBOXYLATE SUCH AS A TRIMELLITATE OR PYROMELLITATE POLYPLASTICS CO. LTD. (JP) 2001-01-30 US disclosed
EP-0954558-A1 FUEL COMPOSITIONS EXHIBITING IMPROVED FUEL STABILITY ORR, William C. (US) 1999-11-10 EP disclosed
WO-1998026028-A1 FUEL COMPOSITIONS EXHIBITING IMPROVED FUEL STABILITY ORR WILLIAM C (US) 1998-06-18 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260018421-A1 SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD ESPL1, SMS, SGMS1 ESR1 1453/4885ESR2 1771/4885NR1H2 483/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.