Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL28482069 | 0.87 | — | — | |
| Water SCHEMBL16698818 | 0.87 | — | — | |
| Water SCHEMBL28979386 | 0.87 | — | — | |
| Water SCHEMBL20895685 | 0.87 | — | — | |
| Water SCHEMBL1720710 | 0.87 | — | — | |
| Water SCHEMBL2743860 | 0.87 | — | — | |
| Water SCHEMBL1428704 | 0.87 | — | — | |
| Water SCHEMBL23300512 | 0.75 | — | — | |
| Water SCHEMBL22117316 | 0.75 | — | — | |
| Water SCHEMBL20512284 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260121003-A1 | STAGE AND PLASMA PROCESSING APPARATUS | TOKYO ELECTRON LIMITED (JP) | 2026-04-30 | — | — | US | claimed |
| US-12529554-B2 | Sensor and band pass filter | FUJIFILM CORPORATION (JP) | 2026-01-20 | — | — | US | claimed |
| CN-220569197-U | Fingerprint sensor and electronic device comprising same | 三星显示有限公司 | 2024-03-08 | — | — | CN | claimed |
| CN-115705744-A | Fingerprint sensor and electronic device comprising same | 三星显示有限公司 | 2023-02-17 | — | — | CN | claimed |
| US-20260121003-A1 | STAGE AND PLASMA PROCESSING APPARATUS | TOKYO ELECTRON LIMITED (JP) | 2026-04-30 | — | — | US | disclosed |
| US-12590012-B2 | Negative thermal expansion material and composite material | NIPPON CHEMICAL INDUSTRIAL CO., LTD. (JP) | 2026-03-31 | — | — | US | disclosed |
| US-12529554-B2 | Sensor and band pass filter | FUJIFILM CORPORATION (JP) | 2026-01-20 | — | — | US | disclosed |
| US-12378417-B2 | Cured product of resin composition, laminate, and resin composition | NIPPON SHEET GLASS COMPANY, LIMITED (JP) | 2025-08-05 | — | — | US | disclosed |
| EP-3778701-B1 | CURED PRODUCT OF RESIN COMPOSITION, LAMINATE AND RESIN COMPOSITION | NIPPON SHEET GLASS CO LTD (JP) | 2025-07-09 | — | — | EP | disclosed |
| US-12297123-B2 | Negative thermal expansion material, method for producing the same, and composite material | NIPPON CHEMICAL INDUSTRIAL CO., LTD. (JP) | 2025-05-13 | — | — | US | disclosed |
| US-12275646-B1 | Negative thermal expansion material, method for producing the same, and composite material | NIPPON CHEMICAL INDUSTRIAL CO., LTD. (JP) | 2025-04-15 | — | — | US | disclosed |
| WO-2025074578-A1 | PRINTED WIRING BOARD | 三菱電機株式会社 | 2025-04-10 | — | — | WO | disclosed |
| EP-3360848-B1 | NEGATIVE THERMAL EXPANSION MATERIAL AND COMPOSITE MATERIAL INCLUDING SAME | NIPPON CHEMICAL IND (JP) | 2020-12-16 | — | — | EP | disclosed |
| CN-111918899-A | Cured product of resin composition, laminate, and resin composition | 日本板硝子株式会社 | 2020-11-10 | — | — | CN | disclosed |
| WO-2019187988-A1 | CURED PRODUCT OF RESIN COMPOSITION, LAMINATE AND RESIN COMPOSITION | 日本板硝子株式会社 | 2019-10-03 | — | — | WO | disclosed |
| US-20190295832-A1 | Member for use in mass spectrometer | SHIMADZU CORPORATION (JP) | 2019-09-26 | — | — | US | disclosed |
| US-10280086-B2 | Negative thermal expansion material and composite material comprising same | NIPPON CHEMICAL INDUSTRIAL CO., LTD. (JP) | 2019-05-07 | — | — | US | disclosed |
| US-10167197-B2 | Method for producing zirconium tungsten phosphate | NIPPON CHEMICAL INDUSTRIAL CO., LTD. (JP) | 2019-01-01 | — | — | US | disclosed |
| US-20180265358-A1 | METHOD FOR PRODUCING ZIRCONIUM TUNGSTEN PHOSPHATE | NIPPON CHEMICAL INDUSTRIAL CO., LTD. (JP) | 2018-09-20 | — | — | US | disclosed |
| US-20180251376-A1 | NEGATIVE THERMAL EXPANSION MATERIAL AND COMPOSITE MATERIAL COMPRISING SAME | NIPPON CHEMICAL INDUSTRIAL CO., LTD. (JP) | 2018-09-06 | — | — | US | disclosed |