Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 1/20 | 0.35 |
| ▸ | CES1 | P23141 | 1/20 | 0.35 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.35 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.35 |
| ▸ | NR4A3 | Q92570 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.34 |
| ▸ | PTGS1 | P23219 | 2/20 | 0.33 |
| ▸ | NQO2 | P16083 | 1/20 | 0.33 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.33 |
| ▸ | TRPV1 | Q8NER1 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | NR1H2 | P55055 | 2/20 | 0.33 |
| ▸ | NR1H3 | Q13133 | 2/20 | 0.33 |
| ▸ | RORC | P51449 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | MLYCD | O95822 | 2/20 | 0.32 |
| ▸ | ESR1 | P03372 | 1/20 | 0.32 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1474670 | 0.82 | CES2 (0.54) | CES2CES1NR4A1NR4A2NR4A3 | |
| SCHEMBL86047 | 0.81 | NR1H3 (0.53) | NR1H2NR1H3MLYCDSMN1; SMN2 | |
| SCHEMBL26474236 | 0.81 | TSHR (0.35) | CES2CES1NR4A1NR4A2NR4A3 | |
| SCHEMBL1476091 | 0.81 | PDE2A (0.46) | CES2CES1NR4A1NR4A2NR4A3 | |
| SCHEMBL15582362 | 0.79 | HSD11B1 (0.46) | — | |
| SCHEMBL56361 | 0.75 | MAPT (0.40) | CES2CES1GAAMAPTHSD17B10 | |
| SCHEMBL11627251 | 0.75 | TSHR (0.39) | CES2CES1NR4A1NR4A2NR4A3 | |
| SCHEMBL9471595 | 0.75 | SLC2A1 (0.44) | NR4A1NR4A2NR4A3TSHRMAPT | |
| SCHEMBL11281234 | 0.75 | ESR1 (0.43) | TSHRMAPTHSD17B10ESR1ESR2 | |
| SCHEMBL465848 | 0.75 | TSHR (0.52) | TSHRMAPTSMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11644752-B2 | Polymer, positive resist composition, and method of forming resist pattern | ZEON CORPORATION (JP) | 2023-05-09 | — | — | US | disclosed |
| US-20220187708-A1 | POLYMER AND POSITIVE RESIST COMPOSITION | ZEON CORPORATION (JP) | 2022-06-16 | — | — | US | disclosed |
| US-11215925-B2 | Method of forming resist pattern | ZEON CORPORATION (JP) | 2022-01-04 | — | — | US | disclosed |
| US-20210397097-A1 | METHOD OF PRODUCING MOLDED PRODUCT, RESIST FOR COLLECTIVE MOLDING WITH IMPRINT-ELECTRONIC LITHOGRAPHY, METHOD OF PRODUCING REPLICA MOLD, METHOD OF PRODUCING DEVICE, AND IMPRINT MATERIAL | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2021-12-23 | — | — | US | disclosed |
| US-20210072643-A1 | METHOD OF FORMING RESIST PATTERN | ZEON CORPORATION (JP) | 2021-03-11 | — | — | US | disclosed |
| US-20210026244-A1 | POSITIVE RESIST COMPOSITION FOR EUV LITHOGRAPHY AND METHOD OF FORMING RESIST PATTERN | ZEON CORPORATION (JP) | 2021-01-28 | — | — | US | disclosed |
| US-10809618-B2 | Method of forming resist pattern | ZEON CORPORATION (JP) | 2020-10-20 | — | — | US | disclosed |
| US-20200257198-A1 | POSITIVE RESIST COMPOSITION, RESIST FILM FORMATION METHOD, AND LAMINATE MANUFACTURING METHOD | ZEON CORPORATION (JP) | 2020-08-13 | — | — | US | disclosed |
| US-20200073240-A1 | POLYMER, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | ZEON CORPORATION (JP) | 2020-03-05 | — | — | US | disclosed |
| WO-2019151021-A1 | METHOD FOR FORMING RESIST PATTERN | 日本ゼオン株式会社 | 2019-08-08 | — | — | WO | disclosed |
| US-20190056664-A1 | POLYMER, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | ZEON CORPORATION (JP) | 2019-02-21 | — | — | US | disclosed |
| US-20190004425-A1 | METHOD OF FORMING RESIST PATTERN | ZEON CORPORATION (JP) | 2019-01-03 | — | — | US | disclosed |