SCHEMBL208421

SCHEMBL208421

Cc1ccc(S(=O)(=O)CS(C)(=O)=O)cc1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.59
CYP3A4 P08684 1/20 0.59
CYP2C9 P11712 1/20 0.59
CYP2C19 P33261 1/20 0.59
GAA P10253 2/20 0.52
KMT2A Q03164 2/20 0.52
MEN1 O00255 1/20 0.52
CTSK P43235 1/20 0.48
CA12 O43570 1/20 0.48
CA1 P00915 1/20 0.48
CA2 P00918 1/20 0.48
CA3 P07451 1/20 0.48
CA6 P23280 1/20 0.48
CA5A P35218 1/20 0.48
CA7 P43166 1/20 0.48
CA9 Q16790 1/20 0.48
CA5B Q9Y2D0 1/20 0.48
MCHR1 Q99705 2/20 0.47
PLCG1 P19174 1/20 0.46
TLR9 Q9NR96 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL63945 0.88 ALDH1A1 (0.67) ALDH1A1CYP3A4CYP2C9CYP2C19GAA
SCHEMBL29048488 0.80 ALDH1A1 (0.50) ALDH1A1CYP3A4KMT2AMEN1CA12
SCHEMBL6544145 0.79 PSIP1 (0.62) ALDH1A1CA12CA1CA2CA3
SCHEMBL41372 0.78 ALDH1A1 (0.82) ALDH1A1CYP3A4CYP2C9CYP2C19GAA
SCHEMBL86088 0.78 ALDH1A1 (0.67) ALDH1A1CYP3A4CYP2C9CYP2C19GAA
SCHEMBL4001371 0.77 ALDH1A1 (0.87) ALDH1A1CYP3A4CYP2C9CYP2C19GAA
SCHEMBL8971393 0.77 ALDH1A1 (0.87) ALDH1A1CYP3A4CYP2C9CYP2C19GAA
SCHEMBL8970657 0.77 ALDH1A1 (0.87) ALDH1A1CYP3A4CYP2C9CYP2C19GAA
SCHEMBL8970703 0.77 ALDH1A1 (0.87) ALDH1A1CYP3A4CYP2C9CYP2C19GAA
SCHEMBL8971703 0.77 ALDH1A1 (0.87) ALDH1A1CYP3A4CYP2C9CYP2C19GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8475982-B2 Charge-transporting compound, electrophotographic photoreceptor, image-forming apparatus, and process cartridge FUJI XEROX CO., LTD. (JP) 2013-07-02 US disclosed
US-8426093-B2 photosensitive layer has a charge transferring compound having hole transportation ability; hardening by heating, stable electrical properties FUJI XEROX CO., LTD. (JP) 2013-04-23 US disclosed
US-8090287-B2 Charging member cleaning unit, method of producing charging member cleaning unit, charging device, process cartridge and image forming apparatus FUJI XEROX CO., LTD. (JP) 2012-01-03 US disclosed
US-8090298-B2 Electrostatic charging member, electrostatic charging device, process cartridge and image forming apparatus FUJI XEROX CO., LTD. (JP) 2012-01-03 US disclosed
EP-0989460-B1 PATTERN FORMING METHOD AZ ELECTRONIC MATERIALS USA (US) 2010-05-26 EP disclosed
US-20100104316-A1 ELECTROSTATIC CHARGING MEMBER, ELECTROSTATIC CHARGING DEVICE, PROCESS CARTRIDGE AND IMAGE FORMING APPARATUS FUJI XEROX CO., LTD. (JP) 2010-04-29 US disclosed
EP-2180376-A2 Electrostatic charging member, electrostatic charging device, process cartridge and image forming apparatus Fuji Xerox Co., Ltd. (JP) 2010-04-28 EP disclosed
US-20090162092-A1 CHARGING MEMBER CLEANING UNIT, METHOD OF PRODUCING CHARGING MEMBER CLEANING UNIT, CHARGING DEVICE, PROCESS CARTRIDGE AND IMAGE FORMING APPARATUS FUJI XEROX CO., LTD. (JP) 2009-06-25 US disclosed
US-20090067874-A1 Charging device, process cartridge, image forming apparatus, and cleaning member FUJI XEROX CO., LTD. (JP) 2009-03-12 US disclosed
US-20080220356-A1 Electrophotographic photoreceptor, process cartridge and image-forming apparatus FUJI XEROX CO., LTD. (JP) 2008-09-11 US disclosed
EP-0520642-B1 Resist material and pattern formation process WAKO PURE CHEM IND LTD (JP) 1998-10-28 EP disclosed
EP-0851298-A1 Radiation sensitive composition adapted for roller coating CLARIANT INTERNATIONAL LTD. (CH) 1998-07-01 EP disclosed
EP-0851297-A1 Radiation-sensitive composition adapted for roller coating CLARIANT INTERNATIONAL LTD. (CH) 1998-07-01 EP disclosed
EP-0838727-A1 Radiation sensitive composition Clariant International Ltd. (CH) 1998-04-29 EP disclosed
US-5670299-A COATING A PHOTORESISTS POLYMER ON A SUBSTRATE, DEVELOPMENT AND HEAT TREATMENT WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1997-09-23 US disclosed
EP-0440374-B1 Chemical amplified resist material WAKO PURE CHEM IND LTD (JP) 1997-04-16 EP disclosed
US-5468589-A Heat resistant, photosensitive patterns WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1995-11-21 US disclosed
US-5350660-A Chemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphere WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1994-09-27 US disclosed
EP-0520642-A1 Resist material and pattern formation process WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1992-12-30 EP disclosed
EP-0440374-A2 Chemical amplified resist material WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1991-08-07 EP disclosed