SCHEMBL63945

SCHEMBL63945

Cc1ccc(S(=O)(=O)CS(=O)(=O)c2ccc(C)cc2)cc1

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 6/20 0.67
▸ CYP3A4 P08684 1/20 0.67
▸ CYP2C9 P11712 1/20 0.67
▸ CYP2C19 P33261 1/20 0.67
▸ GAA P10253 2/20 0.59
▸ PLCG1 P19174 1/20 0.58
▸ KMT2A Q03164 2/20 0.57
▸ MEN1 O00255 1/20 0.57
▸ CA1 P00915 2/20 0.54
▸ CA2 P00918 2/20 0.54
▸ CA12 O43570 1/20 0.54
▸ CA3 P07451 1/20 0.54
▸ CA6 P23280 1/20 0.54
▸ CA5A P35218 1/20 0.54
▸ CA7 P43166 1/20 0.54
▸ CA9 Q16790 1/20 0.54
▸ CA5B Q9Y2D0 1/20 0.54
▸ CTSK P43235 1/20 0.53
▸ TLR9 Q9NR96 1/20 0.52
▸ MCHR1 Q99705 2/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL208421 0.88 ALDH1A1 (0.59) ALDH1A1CYP3A4CYP2C9CYP2C19GAA
SCHEMBL86088 0.84 ALDH1A1 (0.67) ALDH1A1CYP3A4CYP2C9CYP2C19GAA
SCHEMBL41372 0.84 ALDH1A1 (0.82) ALDH1A1CYP3A4CYP2C9CYP2C19GAA
SCHEMBL5463183 0.83 ALDH1A1 (0.87) ALDH1A1CYP3A4CYP2C9CYP2C19GAA
SCHEMBL8971420 0.83 ALDH1A1 (0.87) ALDH1A1CYP3A4CYP2C9CYP2C19GAA
SCHEMBL8971457 0.83 ALDH1A1 (0.87) ALDH1A1CYP3A4CYP2C9CYP2C19GAA
SCHEMBL8971261 0.83 ALDH1A1 (0.87) ALDH1A1CYP3A4CYP2C9CYP2C19GAA
SCHEMBL8971430 0.83 ALDH1A1 (0.87) ALDH1A1CYP3A4CYP2C9CYP2C19GAA
SCHEMBL8971703 0.83 ALDH1A1 (0.87) ALDH1A1CYP3A4CYP2C9CYP2C19GAA
SCHEMBL8971186 0.83 ALDH1A1 (0.87) ALDH1A1CYP3A4CYP2C9CYP2C19GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1026 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110504017-B Preparation and application method of tracer 哈尔滨医科大学 2022-06-10 — — CN claimed
US-20210015439-A1 MOLECULAR IMAGING METHOD FOR EVALUATING LIVER REGENERATION CAPACLITY AFTER ALPPS OPERATION UNIV HARBIN MEDICAL (CN) 2021-01-21 — — US claimed
CN-110504017-A A kind of molecular imaging method for evaluating the postoperative liver regeneration ability of ALPPS UNIV HARBIN MEDICAL 2019-11-26 — — CN claimed
US-8206593-B2 Adapted for on-chip solvent exchange; synthesis of radiopharmaceuticals such as FDG (fludeoxyglucose F18) for example FLUIDIGM CORPORATION (US) 2012-06-26 — — US claimed
US-20080281090-A1 Microfluidic Chemical Reaction Circuits CALIFORNIA INSTITUTE OF TECHNOLOGY (US) 2008-11-13 — — US claimed
US-7419760-B2 Top anti-reflective coating composition, method for forming the pattern of a semiconductor device using the same, and semiconductor device comprising the pattern HYNIX SEMICONDUCTOR INC. (KR) 2008-09-02 — — US claimed
JP-2008522795-A — — 2008-07-03 — — JP claimed
EP-1838431-A2 MICROFLUIDIC DEVICES WITH CHEMICAL REACTION CIRCUITS California Institute of Technology (US) 2007-10-03 — — EP claimed
WO-2006071470-A2 MICROFLUIDIC DEVICES WITH CHEMICAL REACTION CIRCUITS CALIFORNIA INSTITUTE OF TECHNOLOGY (US) 2006-07-06 — — WO claimed
US-20060063104-A1 Top anti-reflective coating composition and method for forming the pattern of a semiconductor device using the same HYNIX SEMICONDUCTOR INC. (KR) 2006-03-23 — — US claimed
US-20260008932-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND RESIST UNDERLAYER FILM FORMATION PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-01-08 — — US disclosed
EP-4675357-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND RESIST UNDERLAYER FILM FORMATION PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2026-01-07 — — EP disclosed
US-12493244-B2 Photosensitive resin composition, photosensitive dry film, and pattern formation method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-12-09 — — US disclosed
CN-114600045-B Photosensitive resin composition, photosensitive dry film and pattern forming method 信越化学工业株式会社 2025-05-09 — — CN disclosed
EP-4050054-B1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD SHINETSU CHEMICAL CO (JP) 2025-04-23 — — EP disclosed
US-5425897-A Electrooptics IDEMITSU KOSAN CO., LTD. (JP) 1995-06-20 — — US disclosed
US-5380915-A Copolymers of polydimethylsiloxane with diene ethers IDEMITSU KOSAN CO., LTD. (JP) 1995-01-10 — — US disclosed
US-5281685-A Polyether pendant groups, polysiloxane repeating units IDEMITSU KOSAN CO., LTD. (JP) 1994-01-25 — — US disclosed
EP-0493601-A1 LIQUID-CRYSTAL COPOLYMER, PRODUCTION THEREOF, DIENE COMPOUND USED IN SAID PRODUCTION, AND PRODUCTION OF SAID COMPOUND IDEMITSU KOSAN COMPANY LIMITED (JP) 1992-07-08 — — EP disclosed
EP-0476865-A1 Resist material and process for forming pattern using the same WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1992-03-25 — — EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260008932-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND RESIST UNDERLAYER FILM FORMATION PROCESS ASH2L, ALKBH2, ITGA1 ALDH1A1 841/4885CYP3A4 2035/4885CYP2C9 2508/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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