SCHEMBL20869201

SCHEMBL20869201

CC(C)(C)Oc1ccc(C=O)cc1O

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.66
AOX1 Q06278 1/20 0.66
TTR P02766 2/20 0.54
KDM4E B2RXH2 1/20 0.52
PTGS2 P35354 1/20 0.52
RAB9A P51151 1/20 0.52
TRIM24 O15164 1/20 0.51
HPGD P15428 1/20 0.51
ALDH5A1 P51649 1/20 0.51
ABAT P80404 1/20 0.51
TDP1 Q9NUW8 1/20 0.51
TRIM33 Q9UPN9 1/20 0.51
TSHR P16473 1/20 0.47
CYP1A2 P05177 1/20 0.42
MAPT P10636 1/20 0.42
FDPS P14324 1/20 0.41
APP P05067 1/20 0.41
POLB P06746 1/20 0.40
TUBB1 Q9H4B7 4/20 0.40
ALOX5 P09917 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8466367 0.86 ALDH1A1 (0.66) ALDH1A1AOX1TTRKDM4EPTGS2
SCHEMBL29991604 0.83 ALDH1A1 (0.57) ALDH1A1AOX1TTRTRIM24HPGD
SCHEMBL18883604 0.83 ALDH1A1 (0.57) ALDH1A1AOX1TTRTRIM24HPGD
SCHEMBL24445666 0.82 ALDH1A1 (0.61) ALDH1A1AOX1TTRKDM4EPTGS2
SCHEMBL16379414 0.82 TRPA1 (0.51) ALDH1A1AOX1TTRCYP1A2MAPT
SCHEMBL4130397 0.80 ALDH1A1 (0.63) ALDH1A1AOX1TTRKDM4EPTGS2
Isovanillin SCHEMBL1535672 0.79 ALDH1A1 (1.00) ALDH1A1AOX1TTRKDM4EPTGS2
Isovanillin SCHEMBL29396443 0.79 ALDH1A1 (1.00) ALDH1A1AOX1TTRKDM4EPTGS2
Isovanillin SCHEMBL70256 0.79 ALDH1A1 (1.00) ALDH1A1AOX1TTRKDM4EPTGS2
SCHEMBL2583316 0.79 ALDH1A1 (0.72) ALDH1A1AOX1TTRKDM4ERAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10983434-B2 Photoresist composition for deep ultraviolet light patterning method and method of manufacturing semiconductor device SAMSUNG ELECTRONICS CO., LTD. (KR) 2021-04-20 US disclosed
US-20190101826-A1 PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LIGHT PATTERNING METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE SAMSUNG ELECTRONICS CO., LTD. (KR) 2019-04-04 US disclosed