SCHEMBL208902

SCHEMBL208902

CC(c1ccccc1)[Si](Cl)(Cl)Cl

nearest known ligand 0.46

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.43
AOC3 Q16853 1/20 0.41
TAAR1 Q96RJ0 3/20 0.41
ADRA2A P08913 1/20 0.39
ADRA2C P18825 1/20 0.39
CYP2D6 P10635 1/20 0.39
LMNA P02545 1/20 0.39
HIF1A Q16665 1/20 0.39
KDM4E B2RXH2 1/20 0.39
NOS2 P35228 1/20 0.39
SRC P12931 1/20 0.39
ALDH1A1 P00352 1/20 0.38
DPP4 P27487 2/20 0.38
TRPA1 O75762 1/20 0.38
F2 P00734 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7795647 1.00 TSHR (0.43) TSHRAOC3TAAR1ADRA2AADRA2C
Toluene SCHEMBL18394200 0.91 LMNA (0.48) TSHRAOC3TAAR1ADRA2AADRA2C
SCHEMBL17442483 0.86 ESR1 (0.39) HIF1AALDH1A1TRPA1
SCHEMBL6671378 0.84 TSHR (0.43) TSHRAOC3TAAR1ADRA2AADRA2C
SCHEMBL7769306 0.84 TSHR (0.43) TSHRAOC3TAAR1ADRA2AADRA2C
SCHEMBL3799465 0.82 ADRA2A (0.43) TSHRAOC3TAAR1ADRA2AADRA2C
SCHEMBL7765413 0.78 TSHR (0.39) TSHRAOC3TAAR1ADRA2AADRA2C
SCHEMBL5484844 0.77 ADRB2 (0.52) TSHRAOC3LMNAHIF1A
SCHEMBL839864 0.77 CHRNA7 (0.41) LMNAALDH1A1TRPA1
SCHEMBL9644426 0.77 CYP3A4 (0.44) TSHRCYP2D6LMNAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 325 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117343638-A Porous spin-on dielectric coating materials from silicon-containing polymers 上海艾深斯科技有限公司 2024-01-05 CN claimed
CN-116500863-A Composition of combined ARC and Si-based hard mask film 上海艾深斯科技有限公司 2023-07-28 CN claimed
CN-108695388-B Semiconductor device and method for manufacturing the same 台湾积体电路制造股份有限公司 2021-09-10 CN claimed
CN-108400085-B The method for forming semiconductor element pattern 联华电子股份有限公司 2019-11-19 CN claimed
CN-109225140-A A kind of modification is except formaldehyde zeolite and preparation method thereof 常州良福朗清生物科技有限公司 2019-01-18 CN claimed
US-20180337266-A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2018-11-22 US claimed
CN-108400085-A Method for forming semiconductor element pattern 联华电子股份有限公司 2018-08-14 CN claimed
US-10038079-B1 Semiconductor device and manufacturing method thereof TAIWAN SEMICONDUTOR MANUFACTURING CO., LTD (TW) 2018-07-31 US claimed
CN-107208354-A Anti-soiling, anti-staining coating and method of applying to textile or other flexible material 休斯敦大学系统 2017-09-26 CN claimed
CN-107207884-A Weather-proof, antimycotic, anti-coloring pollution coating and the method being applied on timber, masonry material or other porous materials 休斯敦大学系统 2017-09-26 CN claimed
CN-103187245-B Method of photoetching of block copolymer through directed self-assembly SEMICONDUCTOR MFG INT SHANGHAI 2015-06-17 CN claimed
CN-103035510-A Contact through hole etching method SEMICONDUCTOR MFG INT CORP 2013-04-10 CN claimed
EP-2494617-A1 METHOD FOR FABRICATING ORGANIC DEVICES IMEC (BE) 2012-09-05 EP claimed
WO-2011051234-A1 METHOD FOR FABRICATING ORGANIC DEVICES IMEC (BE) 2011-05-05 WO claimed
US-7705346-B2 Barrier layer for an organic electronic device XEROX CORPORATION (US) 2010-04-27 US claimed
CN-1877879-A Barrier layer for an organic electronic device XEROX CORP (US) 2006-12-13 CN claimed
US-20060273302-A1 Barrier layer for an organic electronic device XEROX CORPORATION 2006-12-07 US claimed
US-5113001-A Process for preparing sulfophenylalkylsiloxanes or sulfonaphthylalkylsiloxanes BASF CORPORATION (US) 1992-05-12 US claimed
US-5091548-A Solventless process for preparing sulfophenethylsiloxane or sulfonaphyhylethylsiloxanes BASF CORPORATION (US) 1992-02-25 US claimed
US-4575559-A Process for preparing certain sulfophenethylsiloxanes BASF WYANDOTTE CORPORATION (US) 1986-03-11 US claimed