SCHEMBL20912435

SCHEMBL20912435

O=C(O)CCOC(=O)Cc1ccsc1

nearest known ligand 0.55

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 4/20 0.55
MAPT P10636 2/20 0.51
ALDH1A1 P00352 4/20 0.48
THRB P10828 1/20 0.48
HPGD P15428 1/20 0.48
HTT P42858 1/20 0.48
TP53 P04637 1/20 0.47
POLB P06746 1/20 0.47
PTBP1 P26599 1/20 0.46
ESR2 Q92731 1/20 0.46
LMNA P02545 2/20 0.45
SIRT5 Q9NXA8 1/20 0.45
LTA4H P09960 1/20 0.45
SMN1; SMN2 Q16637 1/20 0.45
MEN1 O00255 1/20 0.44
KMT2A Q03164 1/20 0.44
RAB9A P51151 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28035078 0.82 TP53 (0.58) L3MBTL1MAPTALDH1A1THRBHPGD
SCHEMBL28179453 0.81 ALDH1A1 (0.51) L3MBTL1MAPTALDH1A1THRBHPGD
SCHEMBL13065907 0.78 L3MBTL1 (0.55) L3MBTL1MAPTALDH1A1THRBHPGD
SCHEMBL359468 0.78 CYP1A2 (0.60) L3MBTL1MAPTALDH1A1THRBHPGD
SCHEMBL20912421 0.77 SLC1A3 (0.49) L3MBTL1LTA4H
SCHEMBL351615 0.77
SCHEMBL20912446 0.75 LTA4H (0.43) L3MBTL1HPGDLTA4H
SCHEMBL28636520 0.75 AKR1B1 (0.48) L3MBTL1MAPTHTTPOLBLMNA
Hydrochloric Acid SCHEMBL8437714 0.75 AKR1B1 (0.48) L3MBTL1MAPTHTTPOLBLMNA
SCHEMBL10861277 0.75 AKR1B1 (0.48) L3MBTL1MAPTHTTPOLBLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11269251-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-03-08 US disclosed
US-20190113844-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-04-18 US disclosed