SCHEMBL20928664

SCHEMBL20928664

CC(C)(C)OC(=O)C1CC(S)CC(C(=O)O)C1

nearest known ligand 0.41

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
BTK Q06187 1/20 0.41
HRH3 Q9Y5N1 1/20 0.35
HSD17B10 Q99714 1/20 0.33
MAPK1 P28482 1/20 0.32
POLB P06746 1/20 0.32
KMT2A Q03164 1/20 0.31
CHRM2 P08172 1/20 0.31
CHRM1 P11229 1/20 0.31
CHRM3 P20309 1/20 0.31
ACE P12821 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20928821 0.93 HRH3 (0.38) BTKHRH3MAPK1KMT2ACHRM2
SCHEMBL3641879 0.91 BTK (0.46) BTKHRH3HSD17B10MAPK1POLB
SCHEMBL28473594 0.91 BTK (0.46) BTKHRH3HSD17B10MAPK1POLB
SCHEMBL1297489 0.91 BTK (0.46) BTKHRH3HSD17B10MAPK1POLB
SCHEMBL1298062 0.82 HRH3 (0.43) BTKHRH3MAPK1KMT2ACHRM2
SCHEMBL20928954 0.79 CHRNB2 (0.46) HSD17B10MAPK1POLBKMT2A
SCHEMBL26181859 0.77 BTK (0.45) BTKHRH3HSD17B10MAPK1KMT2A
SCHEMBL16671305 0.76 BTK (0.41) BTKHRH3HSD17B10MAPK1POLB
SCHEMBL1296379 0.76 BTK (0.61) BTKHRH3HSD17B10KMT2ACHRM2
SCHEMBL28558391 0.76 BTK (0.49) BTKMAPK1POLBKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11022880-B2 Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound TOKYO OHKA KOGYO CO., LTD. (JP) 2021-06-01 US disclosed
US-20190121233-A1 CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND MERCAPTO COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2019-04-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20190121233-A1 CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND MERCAPTO COMPOUND CUTA, POLR1C, ASIC1 BTK 1142/4885HRH3 2383/4885HSD17B10 4220/4885
US-11022880-B2 Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound CUTA, POLR1C, ASIC1 BTK 1142/4885HRH3 2383/4885HSD17B10 4220/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.