SCHEMBL21026575

SCHEMBL21026575

CC1(C)Cc2cc(O)c(C(=O)O)cc21

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RXRA P19793 4/20 0.45
RARB P10826 2/20 0.43
CSNK2A1 P68400 1/20 0.39
RARA P10276 2/20 0.39
RARG P13631 2/20 0.39
MCL1 Q07820 3/20 0.39
ALDH1A1 P00352 4/20 0.37
MAPT P10636 2/20 0.37
RECQL P46063 2/20 0.37
TDP1 Q9NUW8 2/20 0.37
KDM4E B2RXH2 2/20 0.37
CYP3A4 P08684 1/20 0.37
THRB P10828 1/20 0.37
HPGD P15428 1/20 0.37
ALOX12 P18054 1/20 0.37
CASP1 P29466 1/20 0.37
BLM P54132 1/20 0.37
CASP7 P55210 1/20 0.37
HSD17B10 Q99714 1/20 0.37
CA12 O43570 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7149480 0.78 RXRA (0.69) RXRARARBRARARARGRECQL
SCHEMBL30701833 0.78 RXRA (0.69) RXRARARBRARARARGRECQL
SCHEMBL31335946 0.71 RXRA (0.42) RXRARARBCSNK2A1RARARARG
SCHEMBL21026688 0.70 RARB (0.58) RXRARARBRARARARGKDM4E
SCHEMBL11340266 0.69 RXRA (0.43) RXRARARBRARARARGALDH1A1
Methyl Alcohol SCHEMBL29088014 0.69 CSNK2A1 (0.56) CSNK2A1MCL1ALDH1A1MAPTRECQL
SCHEMBL28646163 0.69 RXRA (0.59) RXRARARBRARARARGRECQL
SCHEMBL163610 0.68 CA1 (0.59) CSNK2A1MCL1ALDH1A1MAPTRECQL
SCHEMBL21682098 0.67 ALDH1A1 (0.48) CSNK2A1ALDH1A1MAPTRECQLTDP1
SCHEMBL6283017 0.67 ALDH1A1 (0.52) CSNK2A1ALDH1A1MAPTRECQLTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11003078-B2 Compositions for forming a protective film against basic aqueous hydrogen peroxide solution, and pattern formation method NISSAN CHEMICAL CORPORATION (JP) 2021-05-11 US disclosed
US-20190163064-A1 COMPOSITION FOR FORMING PROTECTIVE FILM INCLUDING SPECIFIC CROSSLINKING AGENT, AND PATTERN FORMATION METHOD IN WHICH SAME IS USED NISSAN CHEMICAL CORPORATION (JP) 2019-05-30 US disclosed