SCHEMBL21026592

SCHEMBL21026592

CCC(C)(C)c1cc(OC)c(C(=O)O)c(OC)c1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 3/20 0.47
CA1 P00915 3/20 0.47
CA2 P00918 3/20 0.47
CA7 P43166 3/20 0.47
CA9 Q16790 3/20 0.47
CA14 Q9ULX7 3/20 0.47
NPC1 O15118 1/20 0.41
POLB P06746 1/20 0.41
CYP2C9 P11712 1/20 0.41
RAB9A P51151 1/20 0.41
CNR2 P34972 2/20 0.38
RARG P13631 1/20 0.38
RXRA P19793 1/20 0.38
PPARG P37231 1/20 0.38
TSHR P16473 1/20 0.38
CA4 P22748 2/20 0.38
CA6 P23280 2/20 0.38
CA3 P07451 1/20 0.38
PKM P14618 1/20 0.38
CA5A P35218 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL846917 0.81 LTB4R (0.38) POLBRXRAALDH1A1PPARA
SCHEMBL26033050 0.79 ALDH1A1 (0.53) NPC1POLBCYP2C9RAB9APPARG
SCHEMBL9973268 0.78 KDM4E (0.45) NPC1POLBCYP2C9RAB9AMEN1
SCHEMBL17323520 0.77 MAPK1 (0.43) NPC1POLBCYP2C9RAB9ARARG
SCHEMBL421721 0.77 CA12 (0.52) CA12CA1CA2CA7CA9
SCHEMBL12121971 0.76 PTGS2 (0.52) CA9CYP2C9CNR2MEN1ALDH1A1
SCHEMBL846066 0.74 CNR2 (0.41) POLBCNR2TSHRMEN1ALDH1A1
SCHEMBL27435966 0.74 PTGS2 (0.55) CA12CA1CA2CA7CA9
SCHEMBL31240898 0.74 CNR2 (0.36) NPC1RAB9ACNR2RARGRXRA
SCHEMBL846804 0.74 LMNA (0.44) CNR2RARGRXRAPPARGTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11003078-B2 Compositions for forming a protective film against basic aqueous hydrogen peroxide solution, and pattern formation method NISSAN CHEMICAL CORPORATION (JP) 2021-05-11 US disclosed
US-20190163064-A1 COMPOSITION FOR FORMING PROTECTIVE FILM INCLUDING SPECIFIC CROSSLINKING AGENT, AND PATTERN FORMATION METHOD IN WHICH SAME IS USED NISSAN CHEMICAL CORPORATION (JP) 2019-05-30 US disclosed