Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNN4 | O15554 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | ATM | Q13315 | 1/20 | 0.31 |
| ▸ | ESR1 | P03372 | 1/20 | 0.30 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2100791 | 0.79 | KCNN4 (0.36) | KCNN4LMNACYP2D6 | |
| SCHEMBL2101836 | 0.77 | KCNN4 (0.39) | KCNN4LMNACYP2D6TSHRATM | |
| SCHEMBL2101131 | 0.73 | KCNN4 (0.36) | KCNN4LMNACYP2D6TSHRATM | |
| SCHEMBL2273505 | 0.73 | KCNN4 (0.36) | KCNN4LMNACYP2D6TSHRATM | |
| SCHEMBL4241 | 0.72 | ESR1 (0.34) | LMNATSHRATMESR1ESR2 | |
| SCHEMBL2102659 | 0.72 | TSHR (0.38) | KCNN4LMNATSHRATMESR1 | |
| SCHEMBL28069640 | 0.72 | ESR1 (0.34) | LMNATSHRATMESR1ESR2 | |
| SCHEMBL2100774 | 0.72 | TSHR (0.38) | KCNN4LMNATSHRATMESR1 | |
| SCHEMBL450654 | 0.72 | TAAR1 (0.36) | LMNACYP2D6TSHRATMESR1 | |
| SCHEMBL708403 | 0.72 | ESR1 (0.34) | LMNATSHRATMESR1ESR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| US-8164166-B2 | Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2012-04-24 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20090085170-A1 | INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2009-04-02 | — | — | US | disclosed |