Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 3/20 | 0.34 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | NR1H2 | P55055 | 2/20 | 0.32 |
| ▸ | NR1H3 | Q13133 | 2/20 | 0.32 |
| ▸ | TSHR | P16473 | 3/20 | 0.32 |
| ▸ | TAAR1 | Q96RJ0 | 2/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.31 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.31 |
| ▸ | AKT1 | P31749 | 1/20 | 0.31 |
| ▸ | AKT2 | P31751 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.30 |
| ▸ | ACHE | P22303 | 1/20 | 0.30 |
| ▸ | ATM | Q13315 | 1/20 | 0.30 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL703007 | 0.86 | NR1H2 (0.32) | NR1H2NR1H3 | |
| SCHEMBL4241 | 0.79 | ESR1 (0.34) | ESR1ESR2MAPK1NR1H2NR1H3 | |
| SCHEMBL450654 | 0.79 | TAAR1 (0.36) | ESR1ESR2MAPK1NR1H2NR1H3 | |
| SCHEMBL10636310 | 0.78 | MAPK1 (0.39) | ESR1ESR2MAPK1NR1H2NR1H3 | |
| SCHEMBL6391397 | 0.77 | ESR1 (0.33) | ESR1ESR2MAPK1NR1H2NR1H3 | |
| SCHEMBL1314801 | 0.77 | ESR1 (0.38) | ESR1ESR2MAPK1NR1H2NR1H3 | |
| SCHEMBL2492802 | 0.75 | ESR1 (0.32) | ESR1ESR2MAPK1NR1H2NR1H3 | |
| SCHEMBL7752250 | 0.75 | CYP1A2 (0.32) | ESR1ESR2MAPK1NR1H2NR1H3 | |
| SCHEMBL9815122 | 0.73 | ESR1 (0.35) | ESR1ESR2MAPK1NR1H2NR1H3 | |
| SCHEMBL9746360 | 0.73 | TP53 (0.33) | ESR1ESR2MAPK1TSHRTAAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104974184-B | preparation of silazane Compounds | 信越化学工业株式会社 | 2019-12-06 | — | — | CN | disclosed |
| EP-2930177-B1 | PREPARATION OF SILAZANE COMPOUND | SHINETSU CHEMICAL CO (JP) | 2018-04-25 | — | — | EP | disclosed |
| US-9416147-B2 | Preparation of silazane compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-16 | — | — | US | disclosed |
| EP-2930177-A1 | Preparation of silazane compound | Shin-Etsu Chemical Co., Ltd. (JP) | 2015-10-14 | — | — | EP | disclosed |
| CN-104974184-A | Preparation Of Silazane Compound | SHINETSU CHEMICAL CO | 2015-10-14 | — | — | CN | disclosed |
| US-20150284414-A1 | PREPARATION OF SILAZANE COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-10-08 | — | — | US | disclosed |
| EP-2691357-A1 | METHOD FOR PRODUCING 1-HEXENE | Sumitomo Chemical Company Limited (JP) | 2014-02-05 | — | — | EP | disclosed |
| US-20140012056-A1 | METHOD FOR PRODUCING 1-HEXENE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-01-09 | — | — | US | disclosed |
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| WO-2012133929-A1 | METHOD FOR PRODUCING THE TRANSITION METAL ION COMPLEX, CATALYST FOR TRIMERIZATION, AND METHOD FOR PRODUCING 1-HEXENE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-10-04 | — | — | WO | disclosed |
| US-20110275849-A1 | PROCESSES FOR THE PRODUCTION OF TRI-ORGANO-MONOALKOXYSILANES AND PROCESS FOR THE PRODUCTION OF TRI-ORGANO-MONOCHLOROSILANES | BANNOU TADASHI | 2011-11-10 | — | — | US | disclosed |
| US-8008521-B2 | Processes for the production of tri-organo-monoalkoxysilanes and process for the production of tri-organo-monochlorosilanes | HOKKO CHEMICAL INDUSTRY CO., LTD. (JP) | 2011-08-30 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20090082585-A1 | PROCESSES FOR THE PRODUCTION OF TRI-ORGANO-MONOALKOXYSILANES AND PROCESS FOR THE PRODUCTION OF TRI-ORGANO-MONOCHLOROSILANES | BANNOU TADASHI | 2009-03-26 | — | — | US | disclosed |
| US-7459577-B2 | Reacting a chlorosilane with grignard reagent | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-12-02 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| US-20050070730-A1 | Production processes for triorganomonoalkoxysilanes and triorganomonochlorosilanes | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-31 | — | — | US | disclosed |
| US-5100762-A | Radiation-sensitive polymer and radiation-sensitive composition containing the same | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 1992-03-31 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20140012056-A1 | METHOD FOR PRODUCING 1-HEXENE | AP2A1, AP1M1, ME1 | ESR1 452/4885ESR2 641/4885MAPK1 400/4885 |
| US-20110275849-A1 | PROCESSES FOR THE PRODUCTION OF TRI-ORGANO-MONOALKOXYSILANES AND PROCESS FOR THE PRODUCTION OF TRI-ORGANO-MONOCHLOROSILANES | MLX, HAX1, RPS4X | ESR1 1234/4885ESR2 1238/4885MAPK1 2734/4885 |
| US-20090082585-A1 | PROCESSES FOR THE PRODUCTION OF TRI-ORGANO-MONOALKOXYSILANES AND PROCESS FOR THE PRODUCTION OF TRI-ORGANO-MONOCHLOROSILANES | MLX, HAX1, RPS4X | ESR1 1234/4885ESR2 1238/4885MAPK1 2734/4885 |
| US-20150284414-A1 | PREPARATION OF SILAZANE COMPOUND | SLTM, SKP2, BCAT2 | ESR1 4051/4885ESR2 4438/4885MAPK1 1333/4885 |
| US-20050070730-A1 | Production processes for triorganomonoalkoxysilanes and triorganomonochlorosilanes | MLX, HAX1, GRIA3 | ESR1 768/4885ESR2 707/4885MAPK1 2100/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.