Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | USP2 | O75604 | 1/20 | 0.34 |
| ▸ | CASP1 | P29466 | 1/20 | 0.34 |
| ▸ | BRCA1 | P38398 | 1/20 | 0.34 |
| ▸ | CASP7 | P55210 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | RECQL | P46063 | 1/20 | 0.33 |
| ▸ | IDO1 | P14902 | 2/20 | 0.32 |
| ▸ | GRM5 | P41594 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2267117 | 0.84 | IDO1 (0.38) | MEN1USP2CASP1BRCA1CASP7 | |
| SCHEMBL2103218 | 0.81 | CXCL8 (0.34) | USP2CYP3A4 | |
| SCHEMBL2101647 | 0.77 | MAPT (0.33) | USP2RECQL | |
| SCHEMBL8164568 | 0.77 | MEN1 (0.44) | MEN1USP2CASP1BRCA1CASP7 | |
| SCHEMBL2102937 | 0.72 | MEN1 (0.39) | MEN1USP2CASP1BRCA1CASP7 | |
| SCHEMBL2102171 | 0.71 | TSHR (0.31) | TSHR | |
| SCHEMBL2267572 | 0.71 | L3MBTL1 (0.38) | USP2KMT2ATSHRRECQL | |
| SCHEMBL9233119 | 0.70 | TSHR (0.44) | TSHRIDO1 | |
| SCHEMBL8762491 | 0.70 | CYP3A4 (0.47) | MEN1USP2CASP1BRCA1CASP7 | |
| SCHEMBL526384 | 0.70 | IDO1 (0.52) | MEN1USP2CASP1BRCA1CASP7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| US-8164166-B2 | Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2012-04-24 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20090085170-A1 | INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2009-04-02 | — | — | US | disclosed |