SCHEMBL21060835

SCHEMBL21060835

O=C1CCCC(S(=O)(=O)CC(F)(F)F)C1=O

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ADRA2A P08913 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21060840 0.78
SCHEMBL21060836 0.68 PTGS2 (0.41)
SCHEMBL21060841 0.65 ALDH1A1 (0.45)
SCHEMBL21060838 0.63 MAPT (0.63)
SCHEMBL776823 0.63
SCHEMBL4976786 0.61
SCHEMBL31390178 0.61
SCHEMBL7861291 0.60 MAPT (0.38)
SCHEMBL9815663 0.59 ACHE (0.33)
SCHEMBL7200347 0.59 MAPT (0.42)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11884839-B2 Acetal-protected silanol group-containing polysiloxane composition NISSAN CHEMICAL CORPORATION (JP) 2024-01-30 US disclosed
CN-115885217-A Negative resist film laminate and pattern forming method 信越化学工业株式会社 2023-03-31 CN disclosed
CN-109563371-B Polysiloxane composition comprising acetal-protected silanol groups 日产化学株式会社 2021-09-21 CN disclosed
CN-105404096-B Chemically amplified positive resist dry film, dry film laminate and method for producing laminate 信越化学工业株式会社 2021-07-16 CN disclosed
CN-105301905-B Chemically amplified positive resist composition and patterning method 信越化学工业株式会社 2020-11-20 CN disclosed
US-20190185707-A1 ACETAL-PROTECTED SILANOL GROUP-CONTAINING POLYSILOXANE COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2019-06-20 US disclosed