SCHEMBL21087503

SCHEMBL21087503

CCc1cc(C(c2ccc(O)cc2)c2cc(O)c(O)cc2C)c(C)cc1O

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 4/20 0.37
ALOX15 P16050 2/20 0.37
TDP1 Q9NUW8 2/20 0.37
LMNA P02545 1/20 0.37
CYP1A2 P05177 1/20 0.37
PGR P06401 1/20 0.37
CHRM2 P08172 1/20 0.37
CYP3A4 P08684 1/20 0.37
ADORA3 P0DMS8 1/20 0.37
AR P10275 1/20 0.37
CYP2D6 P10635 1/20 0.37
MAPT P10636 1/20 0.37
CHRM1 P11229 1/20 0.37
CYP2C9 P11712 1/20 0.37
DRD1 P21728 1/20 0.37
TBXA2R P21731 1/20 0.37
PTGS1 P23219 1/20 0.37
SLC6A2 P23975 1/20 0.37
CYP2C19 P33261 1/20 0.37
ADRA1A P35348 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19621167 0.88 ALDH1A1 (0.38) ESR1ALOX15CYP1A2CYP3A4AR
SCHEMBL4055460 0.87 ESR1 (0.41) ESR1ALOX15TDP1LMNACYP1A2
SCHEMBL22238306 0.81 PTGS1 (0.39) ESR1ALOX15TDP1LMNACYP1A2
SCHEMBL278773 0.79 CYP1A2 (0.45) ESR1ALOX15TDP1LMNACYP1A2
SCHEMBL20217113 0.78 ALOX15 (0.38) ESR1ALOX15CYP1A2CYP3A4AR
SCHEMBL13416158 0.77 CYP1A2 (0.43) ESR1ALOX15TDP1LMNACYP1A2
SCHEMBL2464369 0.75 ESR1 (0.43) ESR1ALOX15TDP1LMNACYP1A2
SCHEMBL12005179 0.74 CYP3A4 (0.41) ESR1ALOX15CYP1A2CYP3A4CYP2D6
SCHEMBL16859729 0.74 ESR1 (0.46) ESR1ALOX15TDP1LMNACYP1A2
SCHEMBL223739 0.73 ALOX15 (0.42) ESR1ALOX15LMNACYP1A2CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3495434-B1 NOVEL TETRACARBOXYLIC DIANHYDRIDE, POLYIMIDE RESIN AND METHOD FOR PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITIONS, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS SHINETSU CHEMICAL CO (JP) 2020-12-30 EP disclosed
EP-3495434-A1 NOVEL TETRACARBOXYLIC DIANHYDRIDE, POLYIMIDE RESIN AND METHOD FOR PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITIONS, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS Shin-Etsu Chemical Co., Ltd. (JP) 2019-06-12 EP disclosed