SCHEMBL2109467

SCHEMBL2109467

O=[C]NC1CCCCCCCCC1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.45
HSD17B10 Q99714 1/20 0.45
EPHX1 P07099 5/20 0.42
CA1 P00915 4/20 0.42
CA12 O43570 4/20 0.42
NPC1 O15118 3/20 0.42
RAB9A P51151 3/20 0.42
SMN1; SMN2 Q16637 3/20 0.42
ADH1B P00325 2/20 0.42
ADH1C P00326 2/20 0.42
ADH1A P07327 2/20 0.42
CA7 P43166 2/20 0.42
CA14 Q9ULX7 2/20 0.42
CYP3A4 P08684 2/20 0.42
ADH4 P08319 1/20 0.42
MAPT P10636 1/20 0.42
KDM4E B2RXH2 1/20 0.42
EPHX2 P34913 1/20 0.42
CA2 P00918 3/20 0.39
ADH7 P40394 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26145 1.00
SCHEMBL245390 1.00 ALDH1A1 (0.45) ALDH1A1HSD17B10EPHX1CA1CA12
SCHEMBL2112447 1.00 ALDH1A1 (0.45) ALDH1A1HSD17B10EPHX1CA1CA12
SCHEMBL1678761 1.00 ALDH1A1 (0.45) ALDH1A1HSD17B10EPHX1CA1CA12
SCHEMBL9206593 1.00 ALDH1A1 (0.45) ALDH1A1HSD17B10EPHX1CA1CA12
SCHEMBL26241 0.97
SCHEMBL115508 0.91
SCHEMBL24679 0.84
SCHEMBL5639673 0.76 TSHR (0.38) ALDH1A1EPHX1NPC1RAB9ASMN1; SMN2
SCHEMBL33021 0.75 ALDH1A1 (0.50) ALDH1A1HSD17B10EPHX1CA1CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109709770-B Resin composition, dry film and method for producing same, method for producing resist film and substrate, method for producing plated molded article, and mercapto compound 东京应化工业株式会社 2023-11-24 CN disclosed
US-11061326-B2 Chemical amplification type positive photosensitive resin composition, a photosensitive dry film, a method for producing a photosensitive dry film, a method for producing a patterned resist film, a method of manufacturing a template with a substrate, and a method of manufacturing a plated shaped product, and a Mercapto compound TOKYO OHKA KOGYO CO., LTD. (JP) 2021-07-13 US disclosed
US-11022880-B2 Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound TOKYO OHKA KOGYO CO., LTD. (JP) 2021-06-01 US disclosed
US-20200209739-A1 CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2020-07-02 US disclosed
CN-109709770-A The manufacturing method of resin combination, dry film and manufacturing method, resist film and substrate and plating forming object, sulfhydryl compound 东京应化工业株式会社 2019-05-03 CN disclosed
US-20190121233-A1 CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND MERCAPTO COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2019-04-25 US disclosed
US-20190101825-A1 CHEMICAL AMPLIFICATION TYPE POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, A PHOTOSENSITIVE DRY FILM, A METHOD FOR PRODUCING A PHOTOSENSITIVE DRY FILM, A METHOD FOR PRODUCING A PATTERNED RESIST FILM, A METHOD OF MANUFACTURING A TEMPLATE WITH A SUBSTRATE, AND A METHOD OF MANUFACTURING A PLATED SHAPED PRODUCT, AND A MERCAPTO COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2019-04-04 US disclosed
US-20180259853-A1 CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD FOR MANUFACTURING PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD. (JP) 2018-09-13 US disclosed
EP-1903069-B1 NOVEL POLYMER AND METHOD OF MEASURING CHOLESTEROL THEREWITH WAKO PURE CHEM IND LTD (JP) 2015-08-12 EP disclosed
US-8158375-B2 Polymer and method of measuring cholesterol therewith WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2012-04-17 US disclosed
EP-2239281-A2 Novel polymer and method for determining cholesterol using the same Wako Pure Chemical Industries, Ltd. (JP) 2010-10-13 EP disclosed
US-20090215097-A1 Novel Polymer and Method of Measuring Cholesterol Therewith WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2009-08-27 US disclosed
EP-1903069-A1 NOVEL POLYMER AND METHOD OF MEASURING CHOLESTEROL THEREWITH Wako Pure Chemical Industries, Ltd. (JP) 2008-03-26 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20190121233-A1 CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND MERCAPTO COMPOUND CUTA, POLR1C, ASIC1 ALDH1A1 639/4885HSD17B10 4220/4885EPHX1 2343/4885
US-20200209739-A1 CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND COMPOUND CUTA, RAD51, PCNA ALDH1A1 565/4885HSD17B10 2190/4885EPHX1 2595/4885
US-11022880-B2 Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound CUTA, POLR1C, ASIC1 ALDH1A1 639/4885HSD17B10 4220/4885EPHX1 2343/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.