Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 3/20 | 0.46 |
| ▸ | MAPT | P10636 | 3/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.46 |
| ▸ | MEN1 | O00255 | 1/20 | 0.46 |
| ▸ | POLB | P06746 | 1/20 | 0.46 |
| ▸ | HPGD | P15428 | 1/20 | 0.46 |
| ▸ | GFER | P55789 | 1/20 | 0.46 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | ACHE | P22303 | 1/20 | 0.43 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.41 |
| ▸ | GAA | P10253 | 2/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.41 |
| ▸ | CA12 | O43570 | 1/20 | 0.41 |
| ▸ | CA1 | P00915 | 1/20 | 0.41 |
| ▸ | CA2 | P00918 | 1/20 | 0.41 |
| ▸ | CA3 | P07451 | 1/20 | 0.41 |
| ▸ | PKM | P14618 | 1/20 | 0.41 |
| ▸ | CA4 | P22748 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1808984 | 0.89 | EPHX2 (0.49) | CYP3A4MAPTKMT2AMEN1POLB | |
| Benzene SCHEMBL28616661 | 0.85 | EPHX2 (0.46) | CYP3A4MAPTKMT2AMEN1POLB | |
| SCHEMBL3678118 | 0.84 | MAPT (0.48) | CYP3A4MAPTKMT2AMEN1POLB | |
| SCHEMBL12587650 | 0.83 | MAPT (0.52) | CYP3A4MAPTKMT2AMEN1POLB | |
| SCHEMBL15691047 | 0.82 | CYP3A4 (0.47) | CYP3A4MAPTKMT2AMEN1POLB | |
| SCHEMBL5588406 | 0.81 | CYP3A4 (0.50) | CYP3A4MAPTKMT2AMEN1POLB | |
| SCHEMBL684134 | 0.80 | MAPT (0.48) | CYP3A4MAPTKMT2AMEN1POLB | |
| SCHEMBL10584398 | 0.79 | ACHE (0.48) | CYP3A4MAPTKMT2AMEN1POLB | |
| SCHEMBL12586888 | 0.79 | ACHE (0.54) | CYP3A4MAPTKMT2AMEN1POLB | |
| SCHEMBL27984936 | 0.79 | ALOX5 (0.47) | CYP3A4MAPTACHEALOX5GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 492 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117806123-B | Chemical amplification type negative photosensitive polyimide composition and application thereof | 明士(北京)新材料开发有限公司 | 2024-05-31 | — | — | CN | claimed |
| CN-117806123-A | Chemical amplification type negative photosensitive polyimide composition and application thereof | 明士(北京)新材料开发有限公司 | 2024-04-02 | — | — | CN | claimed |
| CN-115561966-B | Chemical amplification type negative photosensitive polyimide coating adhesive and application thereof | 明士(北京)新材料开发有限公司 | 2023-05-16 | — | — | CN | claimed |
| CN-114874441-A | Chemical amplification type positive photosensitive polyimide coating adhesive and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-08-09 | — | — | CN | claimed |
| CN-114488690-A | Chemical amplification type negative polyimide photoresist and preparation method and application thereof | 中国科学院化学研究所 | 2022-05-13 | — | — | CN | claimed |
| CN-111522200-B | Negative PSPI resin for 12-inch silicon wafer and preparation method and application thereof | 中国科学院化学研究所 | 2021-07-27 | — | — | CN | claimed |
| CN-111522200-A | Negative PSPI resin for 12-inch silicon wafer and preparation method and application thereof | 中国科学院化学研究所 | 2020-08-11 | — | — | CN | claimed |
| EP-1806618-B1 | POSITIVE PHOTOSENSITIVE INSULATING RESIN COMPOSITION AND CURED PRODUCT THEREOF | JSR CORP (JP) | 2010-06-09 | — | — | EP | claimed |
| EP-3893054-B1 | PATTERN FORMING METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, AND DEVICE | FUJIFILM CORP (JP) | 2026-05-06 | — | — | EP | disclosed |
| EP-3633455-B1 | PHOTOSENSITIVE RESIN COMPOSITION, POLYMERIC PRECURSOR, CURED FILM, LAMINATE, CURED FILM PRODUCTION METHOD, AND SEMICONDUCTOR DEVICE | FUJIFILM CORP (JP) | 2026-04-08 | — | — | EP | disclosed |
| US-12529958-B2 | Photosensitive resin composition, method for producing resin film having pattern, resin film having pattern, and semiconductor circuit substrate | JSR CORPORATION (JP) | 2026-01-20 | — | — | US | disclosed |
| US-20250382492-A1 | LAMINATE, METHOD FOR MANUFACTURING LAMINATE, HOLLOW STRUCTURE, AND ELECTRONIC COMPONENT | TORAY INDUSTRIES, INC. (JP) | 2025-12-18 | — | — | US | disclosed |
| EP-3859447-B1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, METHOD FOR PRODUCING CURED FILM, AND SEMICONDUCTOR DEVICE | FUJIFILM CORP (JP) | 2025-11-19 | — | — | EP | disclosed |
| US-12473403-B2 | Curable resin composition, cured film, laminate, method for manufacturing cured film, semiconductor device, and polymer precursor | FUJIFILM CORPORATION (JP) | 2025-11-18 | — | — | US | disclosed |
| CN-1457454-A | Precursor composition for positive photosensitive resin and display made with the same | TORAY INDUSTRIES (JP) | 2003-11-19 | — | — | CN | disclosed |
| US-20030194631-A1 | Precursor composition for positive photosensitive resin and display made with the same | TORAY INDUSTRIES, INC. (JP) | 2003-10-16 | — | — | US | disclosed |
| US-6593043-B2 | Polyamic acid ester and/or a polyamic acid having specific end groups; compound having a phenolic hydroxyl group; and a quinonediazide sulfonate. | TORAY INDUSTRIES, INC. (JP) | 2003-07-15 | — | — | US | disclosed |
| US-20020090564-A1 | Polyamic acid ester and/or a polyamic acid having specific end groups; compound having a phenolic hydroxyl group; and a quinonediazide sulfonate. | TORAY INDUSTRIES, INC. (JP) | 2002-07-11 | — | — | US | disclosed |
| CN-1356356-A | Normal Photosensitive resin precursor composition and display using it | TORAY INDUSTRIES (JP) | 2002-07-03 | — | — | CN | disclosed |
| EP-1209523-A2 | Composition of positive photosensitive resin precursor, and display device made thereof | TORAY INDUSTRIES, INC. (JP) | 2002-05-29 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12529958-B2 | Photosensitive resin composition, method for producing resin film having pattern, resin film having pattern, and semiconductor circuit substrate | RER1, ASH2L, ASIC1 | CYP3A4 2487/4885MAPT 2830/4885KMT2A 369/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.