Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | RIPK1 | Q13546 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21189695 | 0.79 | — | — | |
| SCHEMBL5503676 | 0.78 | ALDH1A1 (0.54) | ALDH1A1TSHRTDP1GAASMN1; SMN2 | |
| SCHEMBL21189685 | 0.73 | AAK1 (0.37) | — | |
| SCHEMBL9396200 | 0.72 | ALDH1A1 (0.39) | ALDH1A1TSHRTDP1 | |
| SCHEMBL30772132 | 0.72 | ALDH1A1 (0.50) | ALDH1A1TSHRTDP1GAASMN1; SMN2 | |
| SCHEMBL732202 | 0.72 | ALDH1A1 (0.50) | ALDH1A1TSHRTDP1GAASMN1; SMN2 | |
| SCHEMBL6277129 | 0.71 | TAAR1 (0.43) | ALDH1A1GAASMN1; SMN2RIPK1 | |
| SCHEMBL10604983 | 0.71 | CA2 (0.63) | ALDH1A1TSHRTDP1GAASMN1; SMN2 | |
| SCHEMBL22367879 | 0.70 | ALDH1A1 (0.48) | ALDH1A1TSHRTDP1GAASMN1; SMN2 | |
| SCHEMBL6256646 | 0.70 | ALDH1A1 (0.48) | ALDH1A1TSHRTDP1GAASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210047457-A1 | COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-02-18 | — | — | US | disclosed |
| EP-3744710-A1 | COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-12-02 | — | — | EP | disclosed |
| WO-2019142897-A1 | COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD | 三菱瓦斯化学株式会社 | 2019-07-25 | — | — | WO | disclosed |