SCHEMBL21189685

SCHEMBL21189685

CC(C)CC(C)(c1cc(-c2ccc(S)cc2)ccc1S)c1cc(-c2ccc(S)cc2)ccc1S

nearest known ligand 0.37

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
AAK1 Q2M2I8 7/20 0.37
CYP3A4 P08684 2/20 0.37
GSK3A P49840 1/20 0.33
PRKG2 Q13237 1/20 0.33
MKNK2 Q9HBH9 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21189695 0.76
SCHEMBL21189696 0.73 ALDH1A1 (0.31)
SCHEMBL21189812 0.73 KIF11 (0.31)
SCHEMBL21189637 0.73 KIF11 (0.31)
SCHEMBL21189814 0.72
SCHEMBL21189697 0.71
SCHEMBL23861524 0.71 ALOX5 (0.44)
SCHEMBL21189647 0.70
SCHEMBL21189809 0.69 ESR1 (0.35)
SCHEMBL21189631 0.68 KIF11 (0.40)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3744710-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2020-12-02 EP disclosed
WO-2019142897-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD 三菱瓦斯化学株式会社 2019-07-25 WO disclosed