Water

Water

SCHEMBL21293771

O.O.O.O.O.[Cl-].[Cl-].[Mn+2]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL2487438 1.00
Water SCHEMBL28062869 1.00
Water SCHEMBL12520357 1.00
Water SCHEMBL72277 1.00
Water SCHEMBL18130 1.00
Water SCHEMBL23461833 1.00
Water SCHEMBL2253226 1.00
Water SCHEMBL10915927 0.87 CA4 (0.50)
Water SCHEMBL29026578 0.87
Water SCHEMBL18628818 0.87

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117181235-A Preparation method and application of cobalt-manganese double-doped cerium dioxide heterogeneous catalyst 湖北金宝马环保科技有限公司 2023-12-08 CN claimed
CN-117181235-A Preparation method and application of cobalt-manganese double-doped cerium dioxide heterogeneous catalyst 湖北金宝马环保科技有限公司 2023-12-08 CN disclosed
US-11826981-B2 Compositionally modulated zinc-manganese multilayered coatings THE BOEING COMPANY (US) 2023-11-28 US disclosed
US-20230211582-A1 COMPOSITIONALLY MODULATED ZINC-MANGANESE MULTILAYERED COATINGS THE BOEING COMPANY 2023-07-06 US disclosed
US-11633940-B2 Compositionally modulated zinc-manganese multilayered coatings THE BOEING COMPANY (US) 2023-04-25 US disclosed
CN-114804924-B Manganese-doped gallium oxide-based magnetic ceramic thin film material and preparation method thereof 四川大学 2023-04-14 CN disclosed
CN-114804924-A Manganese-doped gallium oxide-based magnetic ceramic thin film material and preparation method thereof 四川大学 2022-07-29 CN disclosed
US-20210324531-A1 COMPOSITIONALLY MODULATED ZINC-MANGANESE MULTILAYERED COATINGS THE BOEING COMPANY 2021-10-21 US disclosed
US-11066752-B2 Compositionally modulated zinc-manganese multilayered coatings THE BOEING COMPANY (US) 2021-07-20 US disclosed
CN-108706636-B Manganese chloride production process 湖北浩元材料科技有限公司 2021-03-09 CN disclosed
US-20190264344-A1 COMPOSITIONALLY MODULATED ZINC-MANGANESE MULTILAYERED COATINGS THE BOEING COMPANY 2019-08-29 US disclosed