SCHEMBL21361394

SCHEMBL21361394

CNCCN(C)c1c2ccccc2c(N(C)CCNC)c2ccccc12

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PRMT1 Q99873 2/20 0.41
PRMT3 O60678 1/20 0.41
CARM1 Q86X55 1/20 0.41
PRMT6 Q96LA8 1/20 0.41
PRMT8 Q9NR22 1/20 0.41
SIGMAR1 Q99720 2/20 0.40
TAAR1 Q96RJ0 3/20 0.39
ATM Q13315 1/20 0.39
CHRNB2 P17787 1/20 0.38
CHRNA7 P36544 1/20 0.38
CHRNA4 P43681 1/20 0.38
HTR1B P28222 3/20 0.37
HTR2A P28223 2/20 0.37
HTR1D P28221 2/20 0.37
KDM4E B2RXH2 1/20 0.37
ALDH1A1 P00352 1/20 0.37
HTR1A P08908 1/20 0.37
HTT P42858 1/20 0.37
HRH1 P35367 2/20 0.36
SLC6A4 P31645 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1268616 0.77 TAAR1 (0.45) PRMT1PRMT3CARM1PRMT6PRMT8
SCHEMBL18043565 0.72 SLC6A2 (0.42) PRMT1PRMT3CARM1PRMT6PRMT8
SCHEMBL13308774 0.70 MEN1 (0.35) SIGMAR1HTR1BHTR2AKDM4EALDH1A1
SCHEMBL726956 0.69 CYP2C19 (0.51) TAAR1HTR2AKDM4EALDH1A1HTT
SCHEMBL11654756 0.69 TAAR1 (0.50) PRMT1PRMT3CARM1PRMT6PRMT8
SCHEMBL28236945 0.69 SIGMAR1 (0.36) PRMT1PRMT3CARM1PRMT6PRMT8
SCHEMBL898963 0.69 NCF1 (0.53) KDM4EHTTMEN1KMT2A
SCHEMBL1132935 0.68 SLC6A2 (0.46) PRMT1CARM1SIGMAR1ATMHTR1B
Hydrochloric Acid SCHEMBL27281780 0.68 LMNA (0.50) TAAR1HTR2AKDM4EALDH1A1HTT
SCHEMBL9697066 0.67 NCF1 (0.58) SIGMAR1ALDH1A1NOS1NOS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2019173967-A1 PHOTOSENSITIZER, PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, AND METHOD OF PRODUCING WIRING BOARD HITACHI CHEMICAL COMPANY, LTD. (JP) 2019-09-19 WO disclosed