SCHEMBL21396814

SCHEMBL21396814

CC(=O)C(OC(=O)C1CCCC1)S(=O)(=O)O

nearest known ligand 0.36

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 3/20 0.36
LMNA P02545 1/20 0.36
TP53 P04637 1/20 0.35
ADRB2 P07550 1/20 0.33
ADRB1 P08588 1/20 0.33
ADRB3 P13945 1/20 0.33
CHRM2 P08172 1/20 0.33
CHRM4 P08173 1/20 0.33
CHRM1 P11229 1/20 0.33
CHRM3 P20309 1/20 0.33
HTT P42858 1/20 0.32
KMT2A Q03164 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
CES2 O00748 1/20 0.31
CES1 P23141 1/20 0.31
ALDH1A1 P00352 2/20 0.31
TSHR P16473 1/20 0.30
MDM2 Q00987 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23921449 0.98 SMN1; SMN2 (0.38) SMN1; SMN2LMNATP53ADRB2ADRB1
SCHEMBL21396824 0.80 ALDH1A1 (0.37) SMN1; SMN2LMNAADRB2ADRB1ADRB3
SCHEMBL21398868 0.73 NAAA (0.43) TSHR
SCHEMBL23143129 0.71 EPHX1 (0.38) SMN1; SMN2LMNACHRM2CHRM4CHRM1
SCHEMBL11386664 0.70 SMN1; SMN2 (0.40) SMN1; SMN2LMNAADRB2ADRB1ADRB3
SCHEMBL3483078 0.70 SMN1; SMN2 (0.42) SMN1; SMN2LMNAADRB2ADRB1ADRB3
SCHEMBL21396924 0.69 CES2 (0.37) SMN1; SMN2CHRM2CHRM4CHRM1CHRM3
SCHEMBL2681470 0.69 LMNA (0.35) SMN1; SMN2LMNAADRB2ADRB1ADRB3
SCHEMBL12704900 0.69 SMN1; SMN2 (0.40) SMN1; SMN2LMNAADRB2ADRB1ADRB3
SCHEMBL27873555 0.69 MEN1 (0.35) SMN1; SMN2LMNAADRB2ADRB1ADRB3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12032290-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-07-09 US disclosed
US-20210318616-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2021-10-14 US disclosed
US-11073762-B2 Actinic ray-sensitive or radiation sensitive resin composition, actinic raysensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and photoacid generator FUJIFILM CORPORATION (JP) 2021-07-27 US disclosed
US-20190294042-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2019-09-26 US disclosed
US-20190294043-A1 ACTINIC RAY-SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTINIC RAYSENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND PHOTOACID GENERATOR FUJIFILM CORPORATION (JP) 2019-09-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11073762-B2 Actinic ray-sensitive or radiation sensitive resin composition, actinic raysensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and photoacid generator PRKAR2A, PRKAR2B, RER1 SMN1; SMN2 4243/4885LMNA 1888/4885TP53 4474/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.