SCHEMBL2142283

SCHEMBL2142283

O=C(OCCN1CCOCC1)C1C2C=CC(C2)C1C(=O)OCCN1CCOCC1

nearest known ligand 0.48

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ATM Q13315 1/20 0.48
ALDH1A1 P00352 6/20 0.46
KMT2A Q03164 3/20 0.45
LMNA P02545 2/20 0.45
GAA P10253 1/20 0.43
SMN1; SMN2 Q16637 2/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
BCHE P06276 1/20 0.42
MEN1 O00255 2/20 0.41
CYP1A2 P05177 1/20 0.41
CYP3A4 P08684 1/20 0.41
CYP2D6 P10635 1/20 0.41
CYP2C9 P11712 1/20 0.41
PKM P14618 1/20 0.41
CYP2C19 P33261 1/20 0.41
PRCP P42785 1/20 0.41
TMEM97 Q5BJF2 1/20 0.41
SIGMAR1 Q99720 1/20 0.41
POLB P06746 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7744444 0.95 ALDH1A1 (0.50) ATMALDH1A1KMT2ALMNAGAA
SCHEMBL7736623 0.86 ALDH1A1 (0.44) ALDH1A1KMT2ALMNASMN1; SMN2BCHE
SCHEMBL7742317 0.85 KMT2A (0.46) ALDH1A1KMT2ALMNASMN1; SMN2BCHE
SCHEMBL2140681 0.82 ALDH1A1 (0.41) ALDH1A1KMT2ALMNASMN1; SMN2MEN1
SCHEMBL7736626 0.81 ALDH1A1 (0.54) ALDH1A1KMT2ALMNASMN1; SMN2MEN1
SCHEMBL2138395 0.81 ATM (0.44) ATMALDH1A1KMT2ALMNAGAA
SCHEMBL7742320 0.80 ALDH1A1 (0.52) ALDH1A1KMT2ALMNASMN1; SMN2MEN1
SCHEMBL12120147 0.79 ALDH1A1 (0.46) ATMALDH1A1KMT2ALMNAGAA
SCHEMBL24177771 0.79 ATM (0.40) ATMALDH1A1KMT2ALMNAGAA
SCHEMBL1377797 0.76 ATM (0.50) ATMALDH1A1KMT2ALMNAGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6426171-B1 BICYCLIC PHOTORESIST MONOMER FOR POLYMER HAVING EXCELLENT ETCHING AND HEAT RESISTANCE AND ENHANCED POST EXPOSURE DELAY STABILITY HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2002-07-30 US claimed
US-8148484-B2 Poly(bicyclo[2.2.1]hept-5-ene-2-carboxylic acid 2-(tert-butylamino)ethyl ester); Poly(bicyclo[2.2.1]hept-5-ene-2-carboxylic acid 2-(dimethylamino)ethyl ester); used for disinfecting, sterilizing, and preventing biofouling in closed or open industrial-water systems and cooling-water systems KE KELIT KUNSTSTOFFWERK GESMBH (AT) 2012-04-03 US disclosed
US-20080251460-A1 Biocidal Polymers KE KELIT KUNSTSTOFFWERK GESMBH (AT) 2008-10-16 US disclosed
US-6426171-B1 BICYCLIC PHOTORESIST MONOMER FOR POLYMER HAVING EXCELLENT ETCHING AND HEAT RESISTANCE AND ENHANCED POST EXPOSURE DELAY STABILITY HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2002-07-30 US disclosed