SCHEMBL7736623

SCHEMBL7736623

O=C(OCCN1CCCC1)C1C2C=CC(C2)C1C(=O)OCCN1CCCC1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
POLB P06746 1/20 0.44
KMT2A Q03164 4/20 0.43
MEN1 O00255 3/20 0.43
LMNA P02545 1/20 0.42
HPGD P15428 1/20 0.40
BCHE P06276 1/20 0.39
CHRM2 P08172 1/20 0.39
CHRM4 P08173 1/20 0.39
HTR1A P08908 1/20 0.39
CHRM5 P08912 1/20 0.39
ADRA2A P08913 1/20 0.39
CHRM1 P11229 1/20 0.39
ADRA2B P18089 1/20 0.39
ADRA2C P18825 1/20 0.39
CHRM3 P20309 1/20 0.39
DRD1 P21728 1/20 0.39
HRH2 P25021 1/20 0.39
HTR1B P28222 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7742317 0.98 KMT2A (0.46) ALDH1A1SMN1; SMN2POLBKMT2AMEN1
SCHEMBL7736626 0.94 ALDH1A1 (0.54) ALDH1A1SMN1; SMN2POLBKMT2AMEN1
SCHEMBL7742320 0.93 ALDH1A1 (0.52) ALDH1A1SMN1; SMN2POLBKMT2AMEN1
SCHEMBL2142283 0.86 ATM (0.48) ALDH1A1SMN1; SMN2POLBKMT2AMEN1
SCHEMBL2140681 0.86 ALDH1A1 (0.41) ALDH1A1SMN1; SMN2POLBKMT2AMEN1
SCHEMBL7744444 0.82 ALDH1A1 (0.50) ALDH1A1SMN1; SMN2POLBKMT2AMEN1
SCHEMBL7742251 0.79 ALDH1A1 (0.43) ALDH1A1POLBKMT2AMEN1LMNA
SCHEMBL7741447 0.78 ALDH1A1 (0.44) ALDH1A1POLBKMT2AMEN1LMNA
SCHEMBL12120110 0.76 HSD11B1 (0.47) ALDH1A1SMN1; SMN2POLBKMT2AMEN1
SCHEMBL11515674 0.75 ALDH1A1 (0.51) ALDH1A1SMN1; SMN2POLBLMNATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6426171-B1 BICYCLIC PHOTORESIST MONOMER FOR POLYMER HAVING EXCELLENT ETCHING AND HEAT RESISTANCE AND ENHANCED POST EXPOSURE DELAY STABILITY HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2002-07-30 US claimed
US-6426171-B1 BICYCLIC PHOTORESIST MONOMER FOR POLYMER HAVING EXCELLENT ETCHING AND HEAT RESISTANCE AND ENHANCED POST EXPOSURE DELAY STABILITY HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2002-07-30 US disclosed