Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.54 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.54 |
| ▸ | POLB | P06746 | 2/20 | 0.54 |
| ▸ | LMNA | P02545 | 1/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.40 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | HPGD | P15428 | 2/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | APEX1 | P27695 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7742320 | 0.99 | ALDH1A1 (0.52) | ALDH1A1SMN1; SMN2POLBLMNAKMT2A | |
| SCHEMBL7736623 | 0.94 | ALDH1A1 (0.44) | ALDH1A1SMN1; SMN2POLBLMNAKMT2A | |
| SCHEMBL7742317 | 0.93 | KMT2A (0.46) | ALDH1A1SMN1; SMN2POLBLMNAKMT2A | |
| SCHEMBL7744444 | 0.88 | ALDH1A1 (0.50) | ALDH1A1SMN1; SMN2POLBLMNAKMT2A | |
| SCHEMBL7908352 | 0.83 | ALDH1A1 (0.68) | ALDH1A1SMN1; SMN2POLBLMNAAPEX1 | |
| SCHEMBL2140681 | 0.81 | ALDH1A1 (0.41) | ALDH1A1SMN1; SMN2POLBLMNAKMT2A | |
| SCHEMBL2142283 | 0.81 | ATM (0.48) | ALDH1A1SMN1; SMN2POLBLMNAKMT2A | |
| SCHEMBL7911627 | 0.80 | ALDH1A1 (0.64) | ALDH1A1SMN1; SMN2POLBLMNAAPEX1 | |
| SCHEMBL7911629 | 0.80 | ALDH1A1 (0.64) | ALDH1A1SMN1; SMN2POLBLMNAAPEX1 | |
| SCHEMBL7647029 | 0.79 | ALDH1A1 (0.62) | ALDH1A1SMN1; SMN2POLBLMNAAPEX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6426171-B1 | BICYCLIC PHOTORESIST MONOMER FOR POLYMER HAVING EXCELLENT ETCHING AND HEAT RESISTANCE AND ENHANCED POST EXPOSURE DELAY STABILITY | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-07-30 | — | — | US | claimed |
| US-6426171-B1 | BICYCLIC PHOTORESIST MONOMER FOR POLYMER HAVING EXCELLENT ETCHING AND HEAT RESISTANCE AND ENHANCED POST EXPOSURE DELAY STABILITY | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-07-30 | — | — | US | disclosed |