SCHEMBL7744444

SCHEMBL7744444

O=C(O)C1C2C=CC(C2)C1C(=O)OCCN1CCOCC1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.50
LMNA P02545 2/20 0.50
SMN1; SMN2 Q16637 1/20 0.50
POLB P06746 1/20 0.50
ATM Q13315 1/20 0.44
KMT2A Q03164 3/20 0.41
MEN1 O00255 2/20 0.41
CYP1A2 P05177 1/20 0.41
CYP3A4 P08684 1/20 0.41
CYP2D6 P10635 1/20 0.41
CYP2C9 P11712 1/20 0.41
PKM P14618 1/20 0.41
CYP2C19 P33261 1/20 0.41
PRCP P42785 1/20 0.41
TMEM97 Q5BJF2 1/20 0.41
SIGMAR1 Q99720 1/20 0.41
GAA P10253 1/20 0.40
KDM4E B2RXH2 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.39
BCHE P06276 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2142283 0.95 ATM (0.48) ALDH1A1LMNASMN1; SMN2POLBATM
SCHEMBL7736626 0.88 ALDH1A1 (0.54) ALDH1A1LMNASMN1; SMN2POLBKMT2A
SCHEMBL7742320 0.86 ALDH1A1 (0.52) ALDH1A1LMNASMN1; SMN2POLBKMT2A
SCHEMBL7736623 0.82 ALDH1A1 (0.44) ALDH1A1LMNASMN1; SMN2POLBKMT2A
SCHEMBL7742317 0.80 KMT2A (0.46) ALDH1A1LMNASMN1; SMN2POLBKMT2A
SCHEMBL7908352 0.80 ALDH1A1 (0.68) ALDH1A1LMNASMN1; SMN2POLB
SCHEMBL2140681 0.78 ALDH1A1 (0.41) ALDH1A1LMNASMN1; SMN2POLBKMT2A
SCHEMBL7911627 0.77 ALDH1A1 (0.64) ALDH1A1LMNASMN1; SMN2POLB
SCHEMBL7911629 0.77 ALDH1A1 (0.64) ALDH1A1LMNASMN1; SMN2POLB
SCHEMBL2138395 0.76 ATM (0.44) ALDH1A1LMNASMN1; SMN2POLBATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6426171-B1 BICYCLIC PHOTORESIST MONOMER FOR POLYMER HAVING EXCELLENT ETCHING AND HEAT RESISTANCE AND ENHANCED POST EXPOSURE DELAY STABILITY HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2002-07-30 US claimed
US-6426171-B1 BICYCLIC PHOTORESIST MONOMER FOR POLYMER HAVING EXCELLENT ETCHING AND HEAT RESISTANCE AND ENHANCED POST EXPOSURE DELAY STABILITY HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2002-07-30 US disclosed