Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 3/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.42 |
| ▸ | MTNR1A | P48039 | 3/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | GAA | P10253 | 1/20 | 0.41 |
| ▸ | TGM2 | P21980 | 2/20 | 0.39 |
| ▸ | PPARG | P37231 | 1/20 | 0.39 |
| ▸ | F13A1 | P00488 | 1/20 | 0.39 |
| ▸ | TGM1 | P22735 | 1/20 | 0.39 |
| ▸ | PARP10 | Q53GL7 | 2/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
| ▸ | RAB9A | P51151 | 1/20 | 0.39 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.39 |
| ▸ | PARP15 | Q460N3 | 1/20 | 0.38 |
| ▸ | NQO2 | P16083 | 1/20 | 0.38 |
| ▸ | EGFR | P00533 | 1/20 | 0.37 |
| ▸ | TP53 | P04637 | 1/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29484778 | 0.86 | MEN1 (0.51) | THRBMEN1KMT2AMTNR1AKDM4E | |
| SCHEMBL2167443 | 0.86 | MEN1 (0.51) | THRBMEN1KMT2AMTNR1AKDM4E | |
| SCHEMBL29503759 | 0.86 | THRB (0.52) | THRBMTNR1AKDM4EALDH1A1GAA | |
| SCHEMBL20615267 | 0.84 | THRB (0.51) | THRBMEN1KMT2AKDM4EALDH1A1 | |
| SCHEMBL1844660 | 0.83 | MTNR1A (0.42) | MEN1KMT2AMTNR1AKDM4EALDH1A1 | |
| SCHEMBL1844658 | 0.83 | MTNR1A (0.42) | MEN1KMT2AMTNR1AKDM4EALDH1A1 | |
| SCHEMBL27421526 | 0.82 | THRB (0.45) | THRBMEN1KMT2AALDH1A1TGM2 | |
| SCHEMBL29503672 | 0.82 | THRB (0.49) | THRBMTNR1AALDH1A1TP53CYP3A4 | |
| SCHEMBL28989666 | 0.81 | THRB (0.48) | THRBMTNR1AALDH1A1TP53CYP3A4 | |
| SCHEMBL22195191 | 0.81 | F2 (0.43) | THRBMEN1KMT2AALDH1A1TGM2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 237 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-4715465-A1 | MULTILAYER BODY, METHOD FOR PRODUCING MULTILAYER BODY, AND PHOTOSENSITIVE SURFACE MODIFIER | Nissan Chemical Corporation (JP) | 2026-03-25 | — | — | EP | disclosed |
| US-12585188-B2 | Composition for forming resist underlying film | NISSAN CHEMICAL CORPORATION (JP) | 2026-03-24 | — | — | US | disclosed |
| EP-4679175-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | Nissan Chemical Corporation (JP) | 2026-01-14 | — | — | EP | disclosed |
| US-20250377596-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-12-11 | — | — | US | disclosed |
| US-20250362609-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYFUNCTIONAL SULFONIC ACID | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-27 | — | — | US | disclosed |
| US-20250361419-A1 | COMPOSITION FOR FORMING COATING FILM FOR REMOVING FOREIGN MATTERS AND SEMICONDUCTOR SUBSTRATE | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-27 | — | — | US | disclosed |
| US-20250355357-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-20 | — | — | US | disclosed |
| US-20250348001-A1 | METHOD FOR PRODUCING LAMINATE AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-13 | — | — | US | disclosed |
| US-20250110402-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVING UNSATURATED BOND AND CYCLIC STRUCTURE | NISSAN CHEMICAL CORPORATION (JP) | 2025-04-03 | — | — | US | disclosed |
| EP-1757985-A1 | ANTIREFLECTIVE FILM CONTAINING SULFUR ATOM | Nissan Chemical Industries, Ltd. (JP) | 2007-02-28 | — | — | EP | disclosed |
| EP-1757987-A1 | ANTIREFLECTIVE FILM-FORMING COMPOSITION CONTAINING VINYL ETHER COMPOUND | Nissan Chemical Industries, Ltd. (JP) | 2007-02-28 | — | — | EP | disclosed |
| US-20070020559-A1 | Positive-type photosensitive resin composition and cured film manufactured therefrom | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-01-25 | — | — | US | disclosed |
| US-20060234156-A1 | Composition for formation of underlayer film for lithography containing epoxy compound and carboxylic acid compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-10-19 | — | — | US | disclosed |
| US-20060211256-A1 | Porous underlayer film and underlayer film forming composition used for forming the same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-09-21 | — | — | US | disclosed |
| US-20060210915-A1 | Composition for forming lower layer film for lithography comprising compound having protected carboxyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-09-21 | — | — | US | disclosed |
| EP-1703328-A1 | COMPOSITION FOR FORMING NITRIDE COATING FILM FOR HARD MASK | Nissan Chemical Industries, Ltd. (JP) | 2006-09-20 | — | — | EP | disclosed |
| EP-1662769-A1 | COMPOSITION FOR FORMING LOWER LAYER FILM FOR LITHOGRAPHY COMPRISING COMPOUND HAVING PROTECTED CARBOXYL GROUP | Nissan Chemical Industries, Ltd. (JP) | 2006-05-31 | — | — | EP | disclosed |
| EP-1619555-A1 | POROUS UNDERLAYER FILM AND UNDERLAYER FILM FORMING COMPOSITION USED FOR FORMING THE SAME | Nissan Chemical Industries, Ltd. (JP) | 2006-01-25 | — | — | EP | disclosed |
| EP-1617289-A1 | COMPOSITION FOR FORMATION OF UNDERLAYER FILM FOR LITHOGRAPHY CONTAINING EPOXY COMPOUND AND CARBOXYLIC ACID COMPOUND | Nissan Chemical Industries, Ltd. (JP) | 2006-01-18 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | SRSF1, MACF1, SRPK1 | THRB 4180/4885MEN1 2480/4885KMT2A 111/4885 |
| US-12585188-B2 | Composition for forming resist underlying film | SRR, SMC1A, ASH2L | THRB 1775/4885MEN1 1625/4885KMT2A 1145/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.