Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.46 |
| ▸ | TP53 | P04637 | 4/20 | 0.46 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.46 |
| ▸ | TSHR | P16473 | 5/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | MGLL | Q99685 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10417515 | 0.89 | ALDH1A1 (0.53) | THRBALDH1A1TP53HIF1AMAPK1 | |
| SCHEMBL6141641 | 0.87 | ALDH1A1 (0.50) | THRBALDH1A1TP53HIF1AMAPK1 | |
| SCHEMBL21373880 | 0.87 | ALDH1A1 (0.50) | THRBALDH1A1TP53HIF1AMAPK1 | |
| Propylene Oxide SCHEMBL6844507 | 0.85 | THRB (0.55) | THRBALDH1A1TP53HIF1AMAPK1 | |
| Acrylic Acid Ethyl Ester SCHEMBL10794045 | 0.83 | ALDH1A1 (0.46) | THRBALDH1A1TP53HIF1AMAPK1 | |
| SCHEMBL24899788 | 0.82 | THRB (0.48) | THRBALDH1A1TP53HIF1AMAPK1 | |
| Acrylic Acid SCHEMBL2774945 | 0.82 | TSHR (0.46) | THRBALDH1A1TP53MAPK1CYP3A4 | |
| SCHEMBL28210908 | 0.81 | ALDH1A1 (0.50) | ALDH1A1TP53HIF1AMAPK1CYP3A4 | |
| SCHEMBL25269765 | 0.81 | ALDH1A1 (0.47) | THRBALDH1A1TP53HIF1AMAPK1 | |
| SCHEMBL238953 | 0.81 | THRB (0.70) | THRBALDH1A1TP53HIF1AMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2020027024-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PLATING METHOD, AND METHOD FOR PRODUCING METAL PATTERN | 三菱製紙株式会社 | 2020-02-06 | — | — | WO | disclosed |