SCHEMBL21783765

SCHEMBL21783765

O=C(OCCN1CCCCC1)c1cccc(I)c1

nearest known ligand 0.67

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 1/20 0.67
KMT2A Q03164 4/20 0.60
MEN1 O00255 2/20 0.60
L3MBTL1 Q9Y468 1/20 0.54
HPGD P15428 1/20 0.52
CYP2D6 P10635 2/20 0.51
HRH3 Q9Y5N1 1/20 0.50
KDM4E B2RXH2 1/20 0.50
ALDH1A1 P00352 1/20 0.48
CYP1A2 P05177 1/20 0.48
CYP2C9 P11712 1/20 0.48
TSHR P16473 1/20 0.48
THPO P40225 1/20 0.48
PMP22 Q01453 1/20 0.47
SRC P12931 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21705258 0.87 NPSR1 (0.52) NPSR1KMT2AMEN1L3MBTL1HPGD
SCHEMBL21705261 0.87 L3MBTL1 (0.72) NPSR1KMT2AL3MBTL1HPGDHRH3
SCHEMBL21705702 0.87 NPSR1 (0.52) NPSR1KMT2AMEN1L3MBTL1HPGD
SCHEMBL21783808 0.87 NPSR1 (0.52) NPSR1KMT2AMEN1L3MBTL1HPGD
SCHEMBL17213613 0.84 L3MBTL1 (0.75) NPSR1KMT2AMEN1L3MBTL1HPGD
SCHEMBL21705256 0.83 KMT2A (0.76) NPSR1KMT2AMEN1HPGDCYP2D6
SCHEMBL501868 0.83 KMT2A (0.75) NPSR1KMT2AMEN1HPGDCYP2D6
SCHEMBL10084676 0.82 L3MBTL1 (0.77) NPSR1KMT2AMEN1L3MBTL1HPGD
Water SCHEMBL8479966 0.81 KMT2A (0.73) NPSR1KMT2AMEN1HPGDCYP2D6
Hydrochloric Acid SCHEMBL8481680 0.81 KMT2A (0.73) NPSR1KMT2AMEN1HPGDCYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-11187980-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-30 US disclosed
US-20200192222-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-18 US disclosed
US-20200073237-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 US disclosed