Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.52 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.52 |
| ▸ | HRH3 | Q9Y5N1 | 2/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.45 |
| ▸ | MEN1 | O00255 | 2/20 | 0.45 |
| ▸ | GAA | P10253 | 2/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.44 |
| ▸ | ATM | Q13315 | 1/20 | 0.43 |
| ▸ | SLC29A1 | Q99808 | 1/20 | 0.43 |
| ▸ | DRD3 | P35462 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | PKM | P14618 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21783765 | 0.87 | NPSR1 (0.67) | NPSR1L3MBTL1HRH3KMT2AMEN1 | |
| SCHEMBL21705258 | 0.85 | NPSR1 (0.52) | NPSR1L3MBTL1HRH3KMT2AMEN1 | |
| SCHEMBL21705261 | 0.85 | L3MBTL1 (0.72) | NPSR1L3MBTL1HRH3KMT2AGAA | |
| SCHEMBL21705702 | 0.85 | NPSR1 (0.52) | NPSR1L3MBTL1HRH3KMT2AMEN1 | |
| SCHEMBL21705701 | 0.84 | KMT2A (0.56) | NPSR1L3MBTL1HRH3KMT2AMEN1 | |
| SCHEMBL21705720 | 0.76 | KMT2A (0.52) | HRH3KMT2AMEN1DRD3LMNA | |
| SCHEMBL21783771 | 0.74 | KMT2A (0.39) | HRH3KMT2AMEN1ATMSLC29A1 | |
| SCHEMBL14369839 | 0.74 | GAA (0.54) | NPSR1HRH3KMT2AMEN1GAA | |
| SCHEMBL21705609 | 0.73 | KMT2A (0.39) | KMT2AMEN1ATMSLC29A1LMNA | |
| SCHEMBL16349527 | 0.73 | LMNA (0.64) | LMNAKDM4EHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11835859-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11774853-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| US-11774853-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| US-20230129578-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230129578-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-11187980-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-11-30 | — | — | US | disclosed |
| US-20200192222-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-06-18 | — | — | US | disclosed |
| US-20200073237-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-03-05 | — | — | US | disclosed |