SCHEMBL21783773

SCHEMBL21783773

O=C(OCCN1CCS(=O)(=O)CC1)c1cc(I)cc(I)c1I

nearest known ligand 0.39

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
HRH3 Q9Y5N1 1/20 0.39
KMT2A Q03164 3/20 0.38
HPGD P15428 1/20 0.38
SLC29A1 Q99808 1/20 0.37
GLA P06280 1/20 0.36
CYP3A4 P08684 1/20 0.36
HTR4 Q13639 1/20 0.36
MEN1 O00255 2/20 0.36
ALDH1A1 P00352 2/20 0.36
NPSR1 Q6W5P4 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
CYP1A2 P05177 1/20 0.36
CYP2D6 P10635 1/20 0.36
CYP2C9 P11712 1/20 0.36
TSHR P16473 1/20 0.36
THPO P40225 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
PMP22 Q01453 1/20 0.35
ATM Q13315 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26426637 0.93 HRH3 (0.41) HRH3KMT2AHPGDSLC29A1CYP3A4
SCHEMBL26426650 0.92 SLC29A1 (0.40) HRH3KMT2ASLC29A1CYP3A4HTR4
SCHEMBL21705616 0.89 HRH3 (0.39) HRH3KMT2AHPGDSLC29A1GLA
SCHEMBL21783772 0.87 HRH3 (0.49) HRH3KMT2AHPGDSLC29A1GLA
SCHEMBL21705754 0.87 KMT2A (0.50) KMT2AHPGDSLC29A1GLACYP3A4
SCHEMBL21705213 0.86 KMT2A (0.52) KMT2AHPGDGLACYP3A4HTR4
SCHEMBL21783771 0.84 KMT2A (0.39) HRH3KMT2AHPGDSLC29A1GLA
SCHEMBL21783770 0.84 HPGD (0.41) KMT2AHPGDSLC29A1GLACYP3A4
SCHEMBL21705199 0.84 ATM (0.52) KMT2AHPGDALDH1A1L3MBTL1CYP1A2
SCHEMBL26426639 0.82 KDM4E (0.41) HRH3KMT2AHPGDSLC29A1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-11187980-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-30 US disclosed
US-20200192222-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-18 US disclosed
US-20200073237-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 US disclosed