SCHEMBL21783770

SCHEMBL21783770

O=C(OCCN1CCNCC1)c1cc(I)cc(I)c1I

nearest known ligand 0.41

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
HPGD P15428 1/20 0.41
KMT2A Q03164 3/20 0.39
ALDH1A1 P00352 4/20 0.39
KDM4E B2RXH2 2/20 0.39
CYP1A2 P05177 1/20 0.39
CYP2D6 P10635 1/20 0.39
CYP2C9 P11712 1/20 0.39
TSHR P16473 1/20 0.39
THPO P40225 1/20 0.39
MEN1 O00255 2/20 0.38
PMP22 Q01453 1/20 0.38
SLC29A1 Q99808 1/20 0.38
GLA P06280 1/20 0.37
CYP3A4 P08684 1/20 0.37
HTR4 Q13639 1/20 0.37
MAPT P10636 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
CREBBP Q92793 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21705614 0.89 HPGD (0.41) HPGDKMT2AALDH1A1KDM4ECYP1A2
SCHEMBL21705754 0.88 KMT2A (0.50) HPGDKMT2AALDH1A1KDM4ECYP1A2
SCHEMBL21705213 0.87 KMT2A (0.52) HPGDKMT2AALDH1A1KDM4ECYP1A2
SCHEMBL21783772 0.86 HRH3 (0.49) HPGDKMT2AALDH1A1KDM4ESLC29A1
SCHEMBL21783771 0.85 KMT2A (0.39) HPGDKMT2AALDH1A1CYP1A2CYP2D6
SCHEMBL21705199 0.85 ATM (0.52) HPGDKMT2AALDH1A1KDM4ECYP1A2
SCHEMBL21783773 0.84 HRH3 (0.39) HPGDKMT2AALDH1A1CYP1A2CYP2D6
SCHEMBL21705218 0.81 ALDH1A1 (0.46) HPGDKMT2AALDH1A1KDM4ECYP1A2
SCHEMBL21705264 0.79 HPGD (0.55) HPGDKMT2AALDH1A1KDM4ECYP1A2
SCHEMBL26426644 0.77 PIM1 (0.35) HTR4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-11187980-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-30 US disclosed
US-20200192222-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-18 US disclosed
US-20200073237-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 US disclosed