Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 1/20 | 0.64 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.64 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.47 |
| ▸ | MEN1 | O00255 | 5/20 | 0.47 |
| ▸ | MAPT | P10636 | 4/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.47 |
| ▸ | LMNA | P02545 | 1/20 | 0.47 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.47 |
| ▸ | GAA | P10253 | 3/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.47 |
| ▸ | HPGD | P15428 | 3/20 | 0.46 |
| ▸ | MAOB | P27338 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.44 |
| ▸ | CA1 | P00915 | 1/20 | 0.44 |
| ▸ | CA2 | P00918 | 1/20 | 0.44 |
| ▸ | TP53 | P04637 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.43 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29967843 | 1.00 | ESR1 (0.64) | ESR1ESR2KMT2AMEN1MAPT | |
| SCHEMBL28529209 | 0.94 | ESR1 (0.57) | ESR1ESR2KMT2AMEN1MAPT | |
| SCHEMBL16674125 | 0.85 | ESR1 (0.51) | ESR1ESR2KMT2AMEN1MAPT | |
| SCHEMBL22829513 | 0.84 | ESR1 (0.51) | ESR1ESR2KMT2AMEN1MAPT | |
| SCHEMBL29616925 | 0.84 | ESR1 (0.51) | ESR1ESR2KMT2AMEN1MAPT | |
| SCHEMBL29462974 | 0.84 | ESR1 (0.78) | ESR1ESR2KMT2AMEN1MAPT | |
| SCHEMBL1847909 | 0.84 | ESR1 (0.78) | ESR1ESR2KMT2AMEN1MAPT | |
| SCHEMBL2688233 | 0.83 | ESR1 (0.59) | ESR1ESR2KMT2AMEN1MAPT | |
| SCHEMBL4658915 | 0.81 | MEN1 (0.51) | ESR1ESR2KMT2AMEN1MAPT | |
| SCHEMBL30232706 | 0.81 | MEN1 (0.51) | ESR1ESR2KMT2AMEN1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 311 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7303855-B2 | Photoresist undercoat-forming material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-04 | — | — | US | claimed |
| US-20060019195-A1 | Photoresist undercoat-forming material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-01-26 | — | — | US | claimed |
| EP-4184248-B1 | COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND AND POLYMER FOR FORMING ORGANIC FILM | SHINETSU CHEMICAL CO (JP) | 2026-04-15 | — | — | EP | disclosed |
| US-12590173-B2 | Composition, pattern forming method, semiconductor device, and method for manufacturing semiconductor device | KIOXIA CORPORATION (JP) | 2026-03-31 | — | — | US | disclosed |
| US-12584023-B2 | Composition for forming organic film, patterning process, and compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-24 | — | — | US | disclosed |
| EP-4398037-B1 | COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2026-01-21 | — | — | EP | disclosed |
| EP-4660703-A2 | METAL-CONTAINING FILM PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-12-10 | — | — | EP | disclosed |
| EP-4239408-B1 | COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND | SHINETSU CHEMICAL CO (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-12443104-B2 | Composition for forming organic film, patterning process, and compound and polymer for forming organic film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-10-14 | — | — | US | disclosed |
| US-12441712-B2 | Material for forming organic film, patterning process, and compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-10-14 | — | — | US | disclosed |
| EP-3842469-B1 | MATERIAL FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND | SHINETSU CHEMICAL CO (JP) | 2025-08-27 | — | — | EP | disclosed |
| EP-1223184-A1 | Polycarbonate resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2002-07-17 | — | — | EP | disclosed |
| US-20020051942-A1 | Photo-or heat-curable resin composition and multilayer printed wiring board | NIPPON STEEL & SUMIKIN CHEMICAL CO., LTD. (JP) | 2002-05-02 | — | — | US | disclosed |
| US-6340737-B2 | COPOLYCARBONATE OF A 9,9-BIS(HYDROXYPHENYL)FLUORENE COMPOUND, A POLYSILOXANE ENDCAPPED WITH A HYDROXYPHENYL GROUP, AND A PHENOLIC DIOL SUCH AS BISPHENOL A; REDUCED OBLIQUE INCIDENCE BIREFRINGENCE, MOLDABILITY, GOOD TRANSPARENCY | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2002-01-22 | — | — | US | disclosed |
| US-20010039313-A1 | Polycarbonate resin and optical article used the same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-11-08 | — | — | US | disclosed |
| EP-1138714-A2 | Polycarbonate resin and optical article used the same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-10-04 | — | — | EP | disclosed |
| EP-0646845-B1 | COLOR FILTER, MATERIAL THEREOF AND RESIN | NIPPON STEEL CORP (JP) | 2001-03-14 | — | — | EP | disclosed |
| US-5721076-A | A PHOTO OR THERMAL CURABLE, ALKALI-DEVELOPABLE PHOTOSENSITIVE POLYESTER MONOMERS CONTAINING ACRYLATED BISPHENOL EPOXY COMPOUNDS AND MONOANHYDIDE OR DIANHYDRIDE COMPOUNDS; | NIPPON STEEL CORPORATION (JP) | 1998-02-24 | — | — | US | disclosed |
| US-5710234-A | POLYORTHOESTERS FOR MOLDING MATERIALS, ADHESIVES AND HEAT RESISTANT POLYMERS | NIPPON STEEL CHEMICAL CO., LTD. (JP) | 1998-01-20 | — | — | US | disclosed |
| EP-0646845-A1 | COLOR FILTER, MATERIAL THEREOF AND RESIN | Nippon Steel Corporation (JP) | 1995-04-05 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12443104-B2 | Composition for forming organic film, patterning process, and compound and polymer for forming organic film | OR10J3, ICAM1, PYM1 | ESR1 2668/4885ESR2 3814/4885KMT2A 1223/4885 |
| US-12584023-B2 | Composition for forming organic film, patterning process, and compound | F12, MLX, F11 | ESR1 1891/4885ESR2 2260/4885KMT2A 3399/4885 |
| US-12441712-B2 | Material for forming organic film, patterning process, and compound | OR10J3, CDH1, EPCAM | ESR1 1396/4885ESR2 3011/4885KMT2A 1094/4885 |
| US-12590173-B2 | Composition, pattern forming method, semiconductor device, and method for manufacturing semiconductor device | TET2, SDC2, TST | ESR1 1651/4885ESR2 2468/4885KMT2A 1337/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.