Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR2 | Q92731 | 3/20 | 0.78 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.61 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.61 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.61 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.61 |
| ▸ | ESR1 | P03372 | 2/20 | 0.57 |
| ▸ | GSTP1 | P09211 | 1/20 | 0.57 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.54 |
| ▸ | HPGD | P15428 | 1/20 | 0.54 |
| ▸ | BCL2L1 | Q07817 | 1/20 | 0.54 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.54 |
| ▸ | HSD17B1 | P14061 | 2/20 | 0.53 |
| ▸ | HSD17B2 | P37059 | 2/20 | 0.53 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.50 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.50 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.50 |
| ▸ | ACMSD | Q8TDX5 | 1/20 | 0.50 |
| ▸ | APP | P05067 | 1/20 | 0.50 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.48 |
| ▸ | MIF | P14174 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30463004 | 1.00 | ESR2 (0.78) | ESR2HDAC4HDAC2HDAC8ALOX5 | |
| SCHEMBL27616562 | 0.94 | ESR2 (0.75) | ESR2HDAC4HDAC2HDAC8ALOX5 | |
| SCHEMBL3016027 | 0.88 | ESR2 (1.00) | ESR2ALOX5ESR1ALDH1A1HPGD | |
| SCHEMBL14283894 | 0.86 | ALOX5 (0.65) | ESR2HDAC4HDAC2HDAC8ALOX5 | |
| SCHEMBL19211556 | 0.86 | HDAC4 (0.66) | ESR2HDAC4HDAC2HDAC8ALOX5 | |
| SCHEMBL17500075 | 0.85 | ALOX5 (0.70) | ESR2HDAC4HDAC2HDAC8ALOX5 | |
| SCHEMBL28988352 | 0.84 | ALOX5 (0.63) | ESR2HDAC4HDAC2HDAC8ALOX5 | |
| SCHEMBL29204860 | 0.84 | ESR2 (0.58) | ESR2HDAC4HDAC2HDAC8ALOX5 | |
| SCHEMBL27582824 | 0.84 | ESR2 (0.62) | ESR2HDAC4HDAC2HDAC8ESR1 | |
| SCHEMBL16812111 | 0.84 | HDAC4 (0.64) | ESR2HDAC4HDAC2HDAC8ALOX5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 371 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118702881-A | Method for continuously preparing phenolic resin | 山东圣泉新材料股份有限公司 | 2024-09-27 | — | — | CN | claimed |
| CN-117776963-A | Synthesis method of phenol by diazotization | 新疆大学 | 2024-03-29 | — | — | CN | claimed |
| CN-106632239-B | A kind of isolonglifolane ketone group hexahydro quinazoline -2- amine schiff's base type fluorescent material and its synthetic method and application | 南京林业大学 | 2019-04-12 | — | — | CN | claimed |
| CN-108697709-A | Methods for treating huntington's disease | PTC医疗公司 | 2018-10-23 | — | — | CN | claimed |
| US-20090284698-A1 | Ink composition, color filter manufactured by using the same, and display device comprising the same | LG CHEM., LTD. (KR) | 2009-11-19 | — | — | US | claimed |
| US-7303855-B2 | Photoresist undercoat-forming material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-04 | — | — | US | claimed |
| US-20060019195-A1 | Photoresist undercoat-forming material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-01-26 | — | — | US | claimed |
| EP-4184248-B1 | COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND AND POLYMER FOR FORMING ORGANIC FILM | SHINETSU CHEMICAL CO (JP) | 2026-04-15 | — | — | EP | disclosed |
| US-12590173-B2 | Composition, pattern forming method, semiconductor device, and method for manufacturing semiconductor device | KIOXIA CORPORATION (JP) | 2026-03-31 | — | — | US | disclosed |
| US-12584023-B2 | Composition for forming organic film, patterning process, and compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-24 | — | — | US | disclosed |
| EP-4398037-B1 | COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2026-01-21 | — | — | EP | disclosed |
| EP-4660703-A2 | METAL-CONTAINING FILM PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-12-10 | — | — | EP | disclosed |
| EP-4239408-B1 | COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND | SHINETSU CHEMICAL CO (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-4457874-A | DISPERSANTS IN HYDRAULIC CEMENTS | DIAMOND SHAMROCK CHEMICALS COMPANY (US) | 1984-07-03 | — | — | US | disclosed |
| EP-0073606-A1 | Condensation products of aromatic sulphonic acids with formaldehyde | DIAMOND SHAMROCK CHEMICALS COMPANY (US) | 1983-03-09 | — | — | EP | disclosed |
| US-4296948-A | A LAYER OF MIXED PHENOLFORMALDEHYDE RESIN AND ACTIVE SILICIC ACID AND TITANIUM DIOXIDE; DISCOLORATION INHIBITION | MITSUBISHI PAPER MILLS, LTD. (JP) | 1981-10-27 | — | — | US | disclosed |
| US-4064179-A | CHEMICAL INTERMEDIATES | GENERAL ELECTRIC COMPANY (US) | 1977-12-20 | — | — | US | disclosed |
| US-4056512-A | COMPOSITION COMPRISING PHENOLIC RESINS AND CURING AMOUNTS TRIAZA PHOSPHAADAMANTANE COMPOUNDS | HOOKER CHEMICALS & PLASTICS CORPORATION (US) | 1977-11-01 | — | — | US | disclosed |
| US-3965182-A | Preparation of aniline from phenol and ammonia | ETHYL CORPORATION (US) | 1976-06-22 | — | — | US | disclosed |
| US-3952063-A | Process for the preparation of an organomercaptophenol from sulfur, a phenol, and an activated olefin or an epoxy compound | GENERAL ELECTRIC COMPANY (US) | 1976-04-20 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12584023-B2 | Composition for forming organic film, patterning process, and compound | F12, MLX, F11 | ESR2 2260/4885HDAC4 4053/4885HDAC2 3481/4885 |
| US-12590173-B2 | Composition, pattern forming method, semiconductor device, and method for manufacturing semiconductor device | TET2, SDC2, TST | ESR2 2468/4885HDAC4 4784/4885HDAC2 4517/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.