SCHEMBL2177663

SCHEMBL2177663

CCCCOB(C)OCCCC

nearest known ligand 0.43

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ADRB2 P07550 1/20 0.43
ADRB1 P08588 1/20 0.43
ADRB3 P13945 1/20 0.43
TSHR P16473 5/20 0.38
CYP3A4 P08684 2/20 0.38
ALDH1A1 P00352 1/20 0.36
LMNA P02545 1/20 0.35
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
THRB P10828 1/20 0.33
ATM Q13315 1/20 0.33
HPGD P15428 2/20 0.31
SMN1; SMN2 Q16637 2/20 0.31
ANPEP P15144 1/20 0.30
LTA4H P09960 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25565605 0.94 ADRB2 (0.39) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL17150115 0.87 DNM1 (0.42) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL18745481 0.82 ADRB2 (0.31) ADRB2ADRB1ADRB3
SCHEMBL18745464 0.82 ADRB2 (0.31) ADRB2ADRB1ADRB3
SCHEMBL19017281 0.82 TSHR (0.52) ADRB2ADRB1ADRB3TSHRALDH1A1
SCHEMBL7796564 0.81
SCHEMBL7796563 0.80
SCHEMBL8727179 0.78 ADRB2 (0.45) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL245354 0.78 ADRB2 (0.45) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL50476 0.78 ADRB2 (0.45) ADRB2ADRB1ADRB3TSHRCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9920196-B2 Propylene-based block copolymer JAPAN POLYPROPYLENE CORPORATION (JP) 2018-03-20 US disclosed
US-9884958-B2 2018-02-06 US disclosed
CN-105339399-B Propylene block copolymer 日本聚丙烯株式会社 2018-01-02 CN disclosed
US-20170174827-A1 CYCLIC ESTER DUAL CURE RESINS FOR ADDITIVE MANUFACTURING CARBON INC (US) 2017-06-22 US disclosed
US-20160137831-A1 PROPYLENE-BASED BLOCK COPOLYMER JAPAN POLYPROPYLENE CORPORATION (JP) 2016-05-19 US disclosed
CN-105339399-A Propylene block copolymer JAPAN POLYPROPYLENE CORP 2016-02-17 CN disclosed
US-8945820-B2 Silicon-containing resist underlayer film-forming composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-02-03 US disclosed
US-8735513-B2 Reactor for propylene polymerization and process for producing propylene polymer JAPAN POLYPROPYLENE CORPORATION (JP) 2014-05-27 US disclosed
US-8546497-B2 2013-10-01 US disclosed
US-20130137271-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-05-30 US disclosed
US-7858827-B2 Process for synthesis of dialkoxyorganoboranes BASF SE (DE) 2010-12-28 US disclosed
EP-2078723-B1 Process for synthesis of organo-oxazaborolidines BASF SE (DE) 2010-12-22 EP disclosed
EP-1893622-B1 PROCESS FOR SYNTHESIS OF DIALKOXYORGANOBORANES BASF SE (DE) 2009-09-02 EP disclosed
EP-2078723-A1 Process for synthesis of organo-oxazaborolidines BASF SE (DE) 2009-07-15 EP disclosed
US-20080200728-A1 Process for Synthesis of Dialkoxyorganoboranes BASF AKTIENGESELLSCHAFT (DE) 2008-08-21 US disclosed
EP-1893622-A2 PROCESS FOR SYNTHESIS OF DIALKOXYORGANOBORANES BASF SE (DE) 2008-03-05 EP disclosed
WO-2006134074-A2 PROCESS FOR SYNTHESIS OF DIALKOXYORGANOBORANES BASF AKTIENGESELLSCHAFT (DE) 2006-12-21 WO disclosed
EP-0808849-B1 Process for the production of ethylenic polymers SHOWA DENKO KK (JP) 2001-12-19 EP disclosed
US-6011127-A CATALYST COMPRISING A CHROMIUM COMPOUND, AN ALUMOXANE AND AN ORGANOMETALLIC ALKOXIDE AND/OR ORGANOMETALLIC SILOXIDE AND A CARRIER SUPPORTING THEREON THESE COMPOUNDS. SHOWA DENKO K.K. (JP) 2000-01-04 US disclosed
EP-0808849-A1 Process for the production of ethylenic polymers SHOWA DENKO KABUSHIKI KAISHA (JP) 1997-11-26 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080200728-A1 Process for Synthesis of Dialkoxyorganoboranes PDXK, TKFC, PFKFB3 ADRB2 2013/4885ADRB1 1505/4885ADRB3 1172/4885
US-20170174827-A1 CYCLIC ESTER DUAL CURE RESINS FOR ADDITIVE MANUFACTURING CD38, PAICS, CAD ADRB2 4175/4885ADRB1 4219/4885ADRB3 3277/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.