SCHEMBL21705264

SCHEMBL21705264

O=C(OCCN1CCNCC1)c1ccccc1I

nearest known ligand 0.55

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
HPGD P15428 1/20 0.55
KMT2A Q03164 1/20 0.52
ALDH1A1 P00352 4/20 0.51
CYP1A2 P05177 1/20 0.51
CYP2D6 P10635 1/20 0.51
CYP2C9 P11712 1/20 0.51
TSHR P16473 1/20 0.51
THPO P40225 1/20 0.51
PMP22 Q01453 1/20 0.50
SIGMAR1 Q99720 1/20 0.45
KDM4E B2RXH2 2/20 0.43
TDP1 Q9NUW8 1/20 0.43
HRH3 Q9Y5N1 2/20 0.43
LTA4H P09960 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21705257 0.86 KMT2A (0.69) HPGDKMT2AALDH1A1CYP1A2CYP2D6
SCHEMBL21705720 0.84 KMT2A (0.52) HPGDKMT2AALDH1A1CYP1A2CYP2D6
SCHEMBL21705259 0.84 ALDH1A1 (0.67) HPGDKMT2AALDH1A1CYP1A2CYP2D6
SCHEMBL21705697 0.83 KMT2A (0.51) HPGDKMT2AALDH1A1CYP1A2CYP2D6
SCHEMBL18891134 0.80 MEN1 (0.55) HPGDKMT2AALDH1A1SIGMAR1KDM4E
SCHEMBL21783770 0.79 HPGD (0.41) HPGDKMT2AALDH1A1CYP1A2CYP2D6
SCHEMBL15047632 0.78 KMT2A (0.63) HPGDKMT2AALDH1A1CYP2D6KDM4E
SCHEMBL21705614 0.78 HPGD (0.41) HPGDKMT2AALDH1A1CYP1A2CYP2D6
SCHEMBL21705263 0.78 KMT2A (0.56) HPGDKMT2AALDH1A1CYP1A2CYP2D6
SCHEMBL21705258 0.76 NPSR1 (0.52) HPGDKMT2AALDH1A1SIGMAR1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-11480875-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-10-25 US disclosed
US-20220004100-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-01-06 US disclosed
US-11187980-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-30 US disclosed
US-20210048748-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-02-18 US disclosed
US-20200192222-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-18 US disclosed
US-20200073237-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 US disclosed
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-02-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS HNRNPU, HNRNPR, ZFR HPGD 4313/4885KMT2A 913/4885ALDH1A1 4859/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.