SCHEMBL21783809

SCHEMBL21783809

O=S1(=O)CCN(CCOC(O)c2cccc(I)c2)CC1

nearest known ligand 0.43

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
SLC6A4 P31645 6/20 0.39
SLC6A3 Q01959 6/20 0.39
HTR2A P28223 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22097575 0.84 SLC6A4 (0.39) SLC6A4SLC6A3
SCHEMBL22097582 0.77 SLC6A4 (0.38) SLC6A4SLC6A3
SCHEMBL21705702 0.76 NPSR1 (0.52) SLC6A4SLC6A3
SCHEMBL22097576 0.75 HPGD (0.32)
SCHEMBL22097572 0.74 HPGD (0.33)
SCHEMBL21104776 0.72 SLC6A3 (0.40) SLC6A4SLC6A3HTR2A
SCHEMBL25142328 0.69 ALDH1A1 (0.51) SLC6A4SLC6A3
SCHEMBL8416508 0.68 SLC6A4 (0.61) SLC6A4SLC6A3
SCHEMBL18946202 0.68 LMNA (0.62) HTR2A
SCHEMBL26784960 0.67 ALDH1A1 (0.51) SLC6A4SLC6A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11187980-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-30 US disclosed
US-20200073237-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 US disclosed