SCHEMBL218284

SCHEMBL218284

C#Cc1ccc(O)cc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7037593 0.92 MMP3 (0.58) —
SCHEMBL28674751 0.92 MMP3 (0.58) —
SCHEMBL11426043 0.85 NR1H2 (0.64) —
SCHEMBL7035102 0.85 MEN1 (0.64) —
SCHEMBL7031637 0.85 ESR1 (0.64) —
SCHEMBL11408543 0.83 LMNA (0.65) —
SCHEMBL28871 0.83 HDAC8 (0.59) —
Ammonia Solution, Strong SCHEMBL22721248 0.79 HDAC8 (0.56) —
SCHEMBL10481152 0.79 HDAC8 (0.56) —
SCHEMBL2474536 0.75 CYP1A2 (0.50) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1127 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120044753-B Photosensitive dry film, photosensitive resin composition, cured film and printed circuit board Hangzhou foster Electronic Materials Co.,Ltd. (CN) 2026-05-26 — — CN claimed
CN-122059955-A Imidazo pyridone compound, photocatalysis continuous synthesis method and application thereof 南京工业大学 2026-05-19 — — CN claimed
CN-122037203-A Conductive polymethylsilane and preparation method and application thereof 濮阳市盛源东辰科技有限公司 2026-05-15 — — CN claimed
US-20260126721-A1 EXPANDABLE NEGATIVE PHOTORESIST WITH SUSPENSION MATERIAL AND METHOD FOR REDUCING HORN SHAPES IN SPACER OXIDE USING EXPANDABLE NEGATIVE PHOTORESIST NANYA TECHNOLOGY CORP (TW) 2026-05-07 — — US claimed
WO-2025132403-A2 UPCYCLING OF POLYARYLETHERSULFONE TO MAKE A REACTIVE MACROMER PRODUCT SOLVAY SPECIALTY POLYMERS USA, LLC (US) 2025-06-26 — — WO claimed
CN-120149167-A Method for preparing high-resolution graph based on gas cluster etching 中国科学院光电技术研究所 2025-06-13 — — CN claimed
CN-120044753-A Photosensitive dry film, photosensitive resin composition, cured film and printed circuit board 杭州福斯特电子材料有限公司 2025-05-27 — — CN claimed
CN-113943314-B For semiconductor manufacture is a photoresist of (a) 台湾积体电路制造股份有限公司 2025-05-09 — — CN claimed
CN-119708309-A Narrow distribution copolymer and preparation method and application thereof 上海八亿时空先进材料有限公司 2025-03-28 — — CN claimed
CN-119613591-A Poly (p-hydroxystyrene) photoresist film-forming resin and preparation method thereof 北京光舟科技有限公司 2025-03-14 — — CN claimed
US-6512076-B2 Condensation polymerization of a pentafluorophenyl sulfide and pentafluorophenyl sulfone monomer with dihydroxy monomer; heat, solvent and water resistance; use to make waveguides KWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2003-01-28 — — US claimed
EP-0805796-B1 CELL ADHESION INHIBITORS BIOGEN INC (US) 2002-12-11 — — EP claimed
US-20020115815-A1 Poly (arylene ether sulfide) and poly (arylene ether sulfone) for optical device and method for preparing the same KWAGJU INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2002-08-22 — — US claimed
EP-1219665-A2 Poly (arylene ether sulfide) and poly (arylene ether sulfone) for optical device and method for preparing the same Kwangju Institute of Science and Technology (KR) 2002-07-03 — — EP claimed
US-20020057882-A1 Fluorinated polyethers having perfluorinated aliphatic group and optical waveguide using the same ZEN PHOTONICS CO. LTD. (KR) 2002-05-16 — — US claimed
EP-0744391-B1 Process for the preparation of aromatic acetyles using palladacyclen as acatalysts AVENTIS RES & TECH GMBH & CO (DE) 2001-09-26 — — EP claimed
US-5886240-A Process for preparing aromatic acetylenes using palladacycles as catalysts HOECHST AKTIENGESELLSCHAFT (DE) 1999-03-23 — — US claimed
EP-0690855-B1 BENZOPYRANES AS POTASSIUM CHANNEL OPENERS PFIZER LTD (GB) 1996-12-18 — — EP claimed
EP-0659782-A1 Photodefinable dielectric layers AT&T Corp. (US) 1995-06-28 — — EP claimed
EP-0265857-B1 WATER-SOLUBLE MONOAZODYES CONTAINING A UREIDO GROUP AND TWO SULFONYL FIBER-REACTIVE GROUPS, PROCESS FOR THEIR PREPARATION AND THEIR USE HOECHST CELANESE CORPORATION (US) 1990-09-19 — — EP claimed
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