SCHEMBL218284

SCHEMBL218284

C#Cc1ccc(O)cc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7037593 0.92 MMP3 (0.58)
SCHEMBL28674751 0.92 MMP3 (0.58)
SCHEMBL11426043 0.85 NR1H2 (0.64)
SCHEMBL7035102 0.85 MEN1 (0.64)
SCHEMBL7031637 0.85 ESR1 (0.64)
SCHEMBL11408543 0.83 LMNA (0.65)
SCHEMBL28871 0.83 HDAC8 (0.59)
Ammonia Solution, Strong SCHEMBL22721248 0.79 HDAC8 (0.56)
SCHEMBL10481152 0.79 HDAC8 (0.56)
SCHEMBL2474536 0.75 CYP1A2 (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1127 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120044753-B Photosensitive dry film, photosensitive resin composition, cured film and printed circuit board Hangzhou foster Electronic Materials Co.,Ltd. (CN) 2026-05-26 CN claimed
CN-122059955-A Imidazo pyridone compound, photocatalysis continuous synthesis method and application thereof 南京工业大学 2026-05-19 CN claimed
CN-122037203-A Conductive polymethylsilane and preparation method and application thereof 濮阳市盛源东辰科技有限公司 2026-05-15 CN claimed
US-20260126721-A1 EXPANDABLE NEGATIVE PHOTORESIST WITH SUSPENSION MATERIAL AND METHOD FOR REDUCING HORN SHAPES IN SPACER OXIDE USING EXPANDABLE NEGATIVE PHOTORESIST NANYA TECHNOLOGY CORP (TW) 2026-05-07 US claimed
WO-2025132403-A2 UPCYCLING OF POLYARYLETHERSULFONE TO MAKE A REACTIVE MACROMER PRODUCT SOLVAY SPECIALTY POLYMERS USA, LLC (US) 2025-06-26 WO claimed
CN-120149167-A Method for preparing high-resolution graph based on gas cluster etching 中国科学院光电技术研究所 2025-06-13 CN claimed
CN-120044753-A Photosensitive dry film, photosensitive resin composition, cured film and printed circuit board 杭州福斯特电子材料有限公司 2025-05-27 CN claimed
CN-113943314-B For semiconductor manufacture is a photoresist of (a) 台湾积体电路制造股份有限公司 2025-05-09 CN claimed
CN-119708309-A Narrow distribution copolymer and preparation method and application thereof 上海八亿时空先进材料有限公司 2025-03-28 CN claimed
CN-119613591-A Poly (p-hydroxystyrene) photoresist film-forming resin and preparation method thereof 北京光舟科技有限公司 2025-03-14 CN claimed
US-6512076-B2 Condensation polymerization of a pentafluorophenyl sulfide and pentafluorophenyl sulfone monomer with dihydroxy monomer; heat, solvent and water resistance; use to make waveguides KWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2003-01-28 US claimed
EP-0805796-B1 CELL ADHESION INHIBITORS BIOGEN INC (US) 2002-12-11 EP claimed
US-20020115815-A1 Poly (arylene ether sulfide) and poly (arylene ether sulfone) for optical device and method for preparing the same KWAGJU INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2002-08-22 US claimed
EP-1219665-A2 Poly (arylene ether sulfide) and poly (arylene ether sulfone) for optical device and method for preparing the same Kwangju Institute of Science and Technology (KR) 2002-07-03 EP claimed
US-20020057882-A1 Fluorinated polyethers having perfluorinated aliphatic group and optical waveguide using the same ZEN PHOTONICS CO. LTD. (KR) 2002-05-16 US claimed
EP-0744391-B1 Process for the preparation of aromatic acetyles using palladacyclen as acatalysts AVENTIS RES & TECH GMBH & CO (DE) 2001-09-26 EP claimed
US-5886240-A Process for preparing aromatic acetylenes using palladacycles as catalysts HOECHST AKTIENGESELLSCHAFT (DE) 1999-03-23 US claimed
EP-0690855-B1 BENZOPYRANES AS POTASSIUM CHANNEL OPENERS PFIZER LTD (GB) 1996-12-18 EP claimed
EP-0659782-A1 Photodefinable dielectric layers AT&T Corp. (US) 1995-06-28 EP claimed
EP-0265857-B1 WATER-SOLUBLE MONOAZODYES CONTAINING A UREIDO GROUP AND TWO SULFONYL FIBER-REACTIVE GROUPS, PROCESS FOR THEIR PREPARATION AND THEIR USE HOECHST CELANESE CORPORATION (US) 1990-09-19 EP claimed