Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SHBG | P04278 | 1/20 | 0.55 |
| ▸ | PTGS1 | P23219 | 3/20 | 0.47 |
| ▸ | PTGS2 | P35354 | 3/20 | 0.47 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.47 |
| ▸ | CXCL12 | P48061 | 1/20 | 0.47 |
| ▸ | ESR1 | P03372 | 2/20 | 0.45 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.44 |
| ▸ | CA1 | P00915 | 1/20 | 0.44 |
| ▸ | CA2 | P00918 | 1/20 | 0.44 |
| ▸ | ALK | Q9UM73 | 1/20 | 0.40 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.40 |
| ▸ | CALM1 | P0DP23 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29831656 | 0.92 | SHBG (0.48) | SHBGPTGS1PTGS2HMGB1CXCL12 | |
| SCHEMBL771058 | 0.92 | SHBG (0.48) | SHBGPTGS1PTGS2HMGB1CXCL12 | |
| SCHEMBL17095067 | 0.87 | SHBG (0.44) | SHBGPTGS1PTGS2HMGB1CXCL12 | |
| SCHEMBL13609064 | 0.87 | ALDH1A1 (0.52) | SHBGPTGS1PTGS2HMGB1CXCL12 | |
| SCHEMBL686771 | 0.86 | SHBG (0.55) | SHBGPTGS1PTGS2HMGB1CXCL12 | |
| SCHEMBL4055787 | 0.86 | SHBG (0.47) | SHBGPTGS1PTGS2HMGB1CXCL12 | |
| SCHEMBL5406194 | 0.85 | ALDH1A1 (0.56) | SHBGPTGS1PTGS2HMGB1CXCL12 | |
| SCHEMBL3190810 | 0.84 | SHBG (0.53) | SHBGPTGS1PTGS2HMGB1CXCL12 | |
| SCHEMBL30375445 | 0.84 | SHBG (0.53) | SHBGPTGS1PTGS2HMGB1CXCL12 | |
| SCHEMBL28684704 | 0.84 | SHBG (0.53) | SHBGPTGS1PTGS2HMGB1CXCL12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 102 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119875110-A | Polyphenylene ether, polyphenylene ether solution, resin film, prepreg, and metal-clad laminate | 旭化成株式会社 | 2025-04-25 | — | — | CN | claimed |
| US-12421349-B2 | Polyphenylene ether composition | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2025-09-23 | — | — | US | disclosed |
| CN-119875032-A | Resin composition, resin film, prepreg, and metal-clad laminate | 旭化成株式会社 | 2025-04-25 | — | — | CN | disclosed |
| CN-119875110-A | Polyphenylene ether, polyphenylene ether solution, resin film, prepreg, and metal-clad laminate | 旭化成株式会社 | 2025-04-25 | — | — | CN | disclosed |
| EP-4306571-B1 | POLYPHENYLENE ETHER, METHOD FOR PRODUCING SAME, THERMALLY CURABLE COMPOSITION, PREPREG, AND MULTILAYER BODY | ASAHI CHEMICAL IND (JP) | 2024-12-25 | — | — | EP | disclosed |
| CN-114514261-B | Polyphenylene ether composition | 旭化成株式会社 | 2024-09-10 | — | — | CN | disclosed |
| CN-118496744-A | Varnish and method for producing varnish | 旭化成株式会社 | 2024-08-16 | — | — | CN | disclosed |
| US-20240166812-A1 | POLYPHENYLENE ETHER, PRODUCTION METHOD OF THE SAME, THERMOSETTING COMPOSITION, PREPREG, AND LAMINATE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-05-23 | — | — | US | disclosed |
| CN-113646052-B | Reversible thermochromic composition, reversible thermochromic microcapsule pigment, and writing instrument | 百乐墨水株式会社 | 2024-05-17 | — | — | CN | disclosed |
| CN-117777433-A | Polyphenylene ether, process for producing the same, and thermosetting resin | 中化学科学技术研究有限公司 | 2024-03-29 | — | — | CN | disclosed |
| US-20060204891-A1 | Etching resistance; novolak resin having a fluorene or tetrahydrospirobiindene structure, an organic solvent, an acid generator, and a crosslinker, optionally combined with an intermediate layer having an antireflective effect | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-09-14 | — | — | US | disclosed |
| US-20060188809-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-08-24 | — | — | US | disclosed |
| US-20060019195-A1 | Photoresist undercoat-forming material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-01-26 | — | — | US | disclosed |
| US-20060014106-A1 | Photoresist undercoat-forming material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2006-01-19 | — | — | US | disclosed |
| US-20050282091-A1 | Patterning process and undercoat-forming material | SHIN-ETSU CHEMICAL CO.,LTD. (JP) | 2005-12-22 | — | — | US | disclosed |
| US-20050277756-A1 | Porous film-forming composition, patterning process, and porous sacrificial film | SHIN-ETSU CHEMICAL CO., LTD. | 2005-12-15 | — | — | US | disclosed |
| US-20040259037-A1 | Resist lower layer film material and method for forming a pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-12-23 | — | — | US | disclosed |
| US-20040247900-A1 | Antireflective film material, and antireflective film and pattern formation method using the same | SHIN-ETSU CHEMICAL CO. LTD. (JP) | 2004-12-09 | — | — | US | disclosed |
| US-20040241577-A1 | Resist lower layer film material and method for forming a pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-12-02 | — | — | US | disclosed |
| US-20040191479-A1 | Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-09-30 | — | — | US | disclosed |