SCHEMBL771058

SCHEMBL771058

Cc1cc(Cc2ccc(O)c(O)c2O)cc(C)c1O

nearest known ligand 0.50

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
SHBG P04278 1/20 0.48
ESR1 P03372 1/20 0.48
ESR2 Q92731 1/20 0.48
HMGB1 P09429 1/20 0.42
CXCL12 P48061 1/20 0.42
PTGS1 P23219 1/20 0.42
PTGS2 P35354 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29831656 1.00 SHBG (0.48) SHBGESR1ESR2HMGB1CXCL12
SCHEMBL17095067 0.95 SHBG (0.44) SHBGESR1ESR2HMGB1CXCL12
SCHEMBL218662 0.92 SHBG (0.55) SHBGESR1ESR2HMGB1CXCL12
SCHEMBL21839318 0.90 ESR1 (0.49) SHBGESR1ESR2HMGB1CXCL12
SCHEMBL7757417 0.89 AMY1A (0.54) SHBGESR1ESR2HMGB1CXCL12
SCHEMBL4055787 0.87 SHBG (0.47) SHBGESR1ESR2HMGB1CXCL12
SCHEMBL278275 0.82 MAPT (0.45)
SCHEMBL14462649 0.80 ESR1 (0.63) SHBGESR1ESR2HMGB1CXCL12
Pyrogallol SCHEMBL17453322 0.80 TRPA1 (0.48) SHBGESR1ESR2HMGB1CXCL12
SCHEMBL7776274 0.80 CYP2C9 (0.46)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 264 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9939747-B2 Developing agent and method for producing the same TOSHIBA TEC KABUSHIKI KAISHA (JP) 2018-04-10 US claimed
US-20170038698-A1 DEVELOPING AGENT AND METHOD FOR PRODUCING THE SAME TOSHIBA TEC KABUSHIKI KAISHA (JP) 2017-02-09 US claimed
EP-1902852-A1 Erasable image forming material Kabushiki Kaisha Toshiba (JP) 2008-03-26 EP claimed
US-20080070781-A1 Erasable image forming material KABUSHIKI KAISHA TOSHIBA 2008-03-20 US claimed
US-7302846-B2 Temperature-sensing device for determining the level of a fluid HADALA ANTHONY J 2007-12-04 US claimed
EP-1623274-A2 PHOTORESIST COMPOSITIONS AZ Electronic Materials USA Corp. (US) 2006-02-08 EP claimed
US-20050199057-A1 Temperature-sensing device for determining the level of a fluid HADALA ANTHONY J (US) 2005-09-15 US claimed
WO-2004088423-A2 PHOTORESIST COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (US) 2004-10-14 WO claimed
US-20040197704-A1 Photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. 2004-10-07 US claimed
US-6790582-B1 NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT CLARIANT FINANCE BVI LIMITED (VG) 2004-09-14 US claimed
CN-113646052-B Reversible thermochromic composition, reversible thermochromic microcapsule pigment, and writing instrument 百乐墨水株式会社 2024-05-17 CN disclosed
US-11768434-B2 Polymer having a structure of polyamide, polyamide-imide, or polyimide, photosensitive resin composition, patterning process, photosensitive dry film, and protective film for electric and electronic parts SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-26 US disclosed
US-11768434-B2 Polymer having a structure of polyamide, polyamide-imide, or polyimide, photosensitive resin composition, patterning process, photosensitive dry film, and protective film for electric and electronic parts SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-26 US disclosed
CN-113785023-B Water-based ink composition for reversible thermochromic writing instrument, refill for refill and water-based ballpoint pen incorporating same 株式会社百乐 2023-05-12 CN disclosed
US-11572442-B2 Compound, polyimide resin and method of producing the same, photosensitive resin composition, patterning method and method of forming cured film, interlayer insulating film, surface protective film, and electronic component INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2023-02-07 US disclosed
EP-0980028-A1 Erasable image forming material KABUSHIKI KAISHA TOSHIBA (JP) 2000-02-16 EP disclosed
EP-0943640-A1 HIGHLY HEAT-RESISTANT, HIGH-PURITY POLYARYLATE AND FILM PRODUCED FROM THE SAME UNITIKA LTD. (JP) 1999-09-22 EP disclosed
EP-0477691-B1 Positive-type photoresist composition FUJI PHOTO FILM CO LTD (JP) 1997-07-16 EP disclosed
US-5340686-A Alkali soluble phenol novolak resin, 1,2-quinone diazide compound and low molecular weight novolak compound FUJI PHOTO FILM CO., LTD. (JP) 1994-08-23 US disclosed
EP-0477691-A2 Positive-type photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1992-04-01 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11572442-B2 Compound, polyimide resin and method of producing the same, photosensitive resin composition, patterning method and method of forming cured film, interlayer insulating film, surface protective film, and electronic component BRIX1, RBX1, HAX1 SHBG 2374/4885ESR1 54/4885ESR2 138/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.