SCHEMBL21880552

SCHEMBL21880552

COc1ccc(C(O)(c2ccc(OC)cc2)c2ccc(-c3ccc(C(O)(c4ccc(OC)cc4)c4ccc(OC)cc4)cc3)cc2)cc1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR2 Q92731 1/20 0.58
NPC1 O15118 2/20 0.52
RAB9A P51151 2/20 0.52
TP53 P04637 1/20 0.52
MAPK1 P28482 1/20 0.52
CASP3 P42574 1/20 0.52
SMN1; SMN2 Q16637 1/20 0.52
SENP8 Q96LD8 1/20 0.52
SENP7 Q9BQF6 1/20 0.52
SENP6 Q9GZR1 1/20 0.52
CA12 O43570 1/20 0.50
CA1 P00915 1/20 0.50
CA2 P00918 1/20 0.50
CA7 P43166 1/20 0.50
CA9 Q16790 1/20 0.50
CA14 Q9ULX7 1/20 0.50
CYP17A1 P05093 1/20 0.47
CYP3A4 P08684 1/20 0.47
AHR P35869 1/20 0.47
AOC3 Q16853 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL812742 0.93 CA1 (0.58) ESR2MAPK1CA12CA1CA2
SCHEMBL29205 0.84 CA4 (0.54) SMN1; SMN2CA12CA1CA2CA7
SCHEMBL4656148 0.84 ESR2 (0.61) ESR2NPC1RAB9ATP53MAPK1
SCHEMBL4149468 0.84 ACHE (0.65) NPC1RAB9ASMN1; SMN2CA12CA1
SCHEMBL28797 0.84 CA4 (0.54) SMN1; SMN2CA12CA1CA2CA7
SCHEMBL11608427 0.84 ACHE (0.65) NPC1RAB9ASMN1; SMN2CA12CA1
SCHEMBL13096611 0.83 RAB9A (0.53) NPC1RAB9ASMN1; SMN2CA12CA1
SCHEMBL9471110 0.83 LMNA (0.55) NPC1MAPK1SMN1; SMN2CA12CA1
SCHEMBL6438114 0.83 APP (0.49) MAPK1CA12CA1CA2CA7
SCHEMBL13211691 0.81 ESR2 (0.56) ESR2NPC1RAB9ATP53MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210278766-A1 COATING-TYPE COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, POLYMER, AND METHOD FOR MANUFACTURING POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-09-09 US disclosed
US-10604618-B2 Compound, method for manufacturing the compound, and composition for forming organic film SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-31 US disclosed