Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 1/20 | 0.56 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.56 |
| ▸ | CA1 | P00915 | 1/20 | 0.42 |
| ▸ | CA2 | P00918 | 1/20 | 0.42 |
| ▸ | CA4 | P22748 | 1/20 | 0.42 |
| ▸ | CA6 | P23280 | 1/20 | 0.42 |
| ▸ | THRA | P10827 | 10/20 | 0.41 |
| ▸ | THRB | P10828 | 10/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.39 |
| ▸ | MAPT | P10636 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.39 |
| ▸ | G6PD | P11413 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.39 |
| ▸ | PKM | P14618 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12799169 | 0.97 | ESR1 (0.53) | ESR1ESR2CA1CA2CA4 | |
| SCHEMBL22787078 | 0.88 | ESR1 (0.47) | ESR1ESR2CA1CA2CA4 | |
| SCHEMBL1417388 | 0.87 | AMY1A (0.45) | ESR1ESR2THRATHRBKDM4E | |
| SCHEMBL4449524 | 0.85 | ESR1 (0.41) | ESR1ESR2THRATHRBKDM4E | |
| SCHEMBL16664778 | 0.84 | ESR1 (0.41) | ESR1ESR2CA1CA2CA4 | |
| SCHEMBL4456963 | 0.84 | ESR1 (0.40) | ESR1ESR2THRATHRBMAPT | |
| SCHEMBL16664780 | 0.83 | ESR1 (0.39) | ESR1ESR2THRATHRBMAPT | |
| SCHEMBL4447336 | 0.83 | ESR1 (0.39) | ESR1ESR2THRATHRBMAPT | |
| SCHEMBL19621098 | 0.82 | ESR1 (0.38) | ESR1ESR2THRATHRB | |
| SCHEMBL278487 | 0.81 | ESR1 (0.50) | ESR1ESR2CA1CA2CA4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 90 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11698586-B2 | Negative-working ultra thick film photoresist | MERCK PATENT GMBH (DE) | 2023-07-11 | — | — | US | disclosed |
| US-11698586-B2 | Negative-working ultra thick film photoresist | MERCK PATENT GMBH (DE) | 2023-07-11 | — | — | US | disclosed |
| US-11640110-B2 | Resin composition, method for producing heat-resistant resin film, and display device | TORAY INDUSTRIES, INC. (JP) | 2023-05-02 | — | — | US | disclosed |
| WO-2022233919-A2 | SPIN ON METAL-ORGANIC FORMULATIONS | MERCK PATENT GMBH (DE) | 2022-11-10 | — | — | WO | disclosed |
| US-11366389-B2 | Allyloxy derivative, resist underlayer forming composition using the same, and method of manufacturing resist underlayer and semiconductor device using the same | MERCK PATENT GMBH (DE) | 2022-06-21 | — | — | US | disclosed |
| US-11333976-B2 | Resin, photosensitive resin composition, electronic component and display device using the same | TORAY INDUSTRIES, INC. (JP) | 2022-05-17 | — | — | US | disclosed |
| US-20210181636-A1 | ALLYLOXY DERIVATIVE, RESIST UNDERLAYER FORMING COMPOSITION USING THE SAME, AND METHOD OF MANUFACTURING RESIST UNDERLAYER AND SEMICONDUCTOR DEVICE USING THE SAME | MERCK PATENT GMBH (DE) | 2021-06-17 | — | — | US | disclosed |
| US-20200393758-A1 | NEGATIVE-WORKING ULTRA THICK FILM PHOTORESIST | EMD PERFORMANCE MATERIALS CORPORATION | 2020-12-17 | — | — | US | disclosed |
| US-20200192227-A1 | RESIN COMPOSITION, METHOD FOR PRODUCING HEAT-RESISTANT RESIN FILM, AND DISPLAY DEVICE | TORAY INDUSTRIES, INC. (JP) | 2020-06-18 | — | — | US | disclosed |
| US-20180011402-A1 | RESIN, PHOTOSENSITIVE RESIN COMPOSITION, ELECTRONIC COMPONENT AND DISPLAY DEVICE USING THE SAME | TORAY INDUSTRIES, INC. (JP) | 2018-01-11 | — | — | US | disclosed |
| US-20060159839-A1 | Photosensitive resin composition, electronic component using the same, and display using same | TORAY INDUSTRIES, INC. (JP) | 2006-07-20 | — | — | US | disclosed |
| US-20060110680-A1 | Photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2006-05-25 | — | — | US | disclosed |
| EP-1630605-A1 | PHOTOSENSITIVE RESIN COMPOSITION, AND ELECTRONIC COMPONENT AND DISPLAY USING SAME | TORAY INDUSTRIES, INC. (JP) | 2006-03-01 | — | — | EP | disclosed |
| US-6929890-B2 | Positive-type photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2005-08-16 | — | — | US | disclosed |
| US-20050014876-A1 | Photosensitive resin precursor composition | TORAY INDUSTRIES, INC. (JP) | 2005-01-20 | — | — | US | disclosed |
| EP-1496395-A2 | Photosensitive resin precursor composition | TORAY INDUSTRIES, INC. (JP) | 2005-01-12 | — | — | EP | disclosed |
| EP-1475665-A1 | Positive-type photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2004-11-10 | — | — | EP | disclosed |
| US-20040197703-A1 | Positive-type photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2004-10-07 | — | — | US | disclosed |
| EP-1375463-A1 | OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION | Kansai Research Institute, Inc. (JP) | 2004-01-02 | — | — | EP | disclosed |
| US-20030211421-A1 | Optically active compound and photosensitive resin composition | KRI, INC. (JP) | 2003-11-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11366389-B2 | Allyloxy derivative, resist underlayer forming composition using the same, and method of manufacturing resist underlayer and semiconductor device using the same | ALKBH1, ALKBH2, OR10J3 | ESR1 1701/4885ESR2 1818/4885CA1 3651/4885 |
| US-20210181636-A1 | ALLYLOXY DERIVATIVE, RESIST UNDERLAYER FORMING COMPOSITION USING THE SAME, AND METHOD OF MANUFACTURING RESIST UNDERLAYER AND SEMICONDUCTOR DEVICE USING THE SAME | ALKBH1, ALKBH2, OR10J3 | ESR1 1701/4885ESR2 1818/4885CA1 3651/4885 |
| US-20180011402-A1 | RESIN, PHOTOSENSITIVE RESIN COMPOSITION, ELECTRONIC COMPONENT AND DISPLAY DEVICE USING THE SAME | EED, RPL19, RARA | ESR1 236/4885ESR2 348/4885CA1 4018/4885 |
| US-20030211421-A1 | Optically active compound and photosensitive resin composition | ARCN1, RAD51, PAM | ESR1 392/4885ESR2 895/4885CA1 1984/4885 |
| US-11333976-B2 | Resin, photosensitive resin composition, electronic component and display device using the same | EED, RPL19, RARA | ESR1 236/4885ESR2 348/4885CA1 4018/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.