Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MIF | P14174 | 1/20 | 0.32 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9453175 | 0.86 | MIF (0.34) | MIFNR1H2 | |
| SCHEMBL247199 | 0.86 | MIF (0.34) | MIFNR1H2 | |
| SCHEMBL7720760 | 0.86 | MIF (0.34) | MIFNR1H2 | |
| SCHEMBL5728730 | 0.86 | MIF (0.34) | MIFNR1H2 | |
| SCHEMBL916061 | 0.86 | MIF (0.33) | MIF | |
| SCHEMBL9370192 | 0.86 | MIF (0.33) | MIF | |
| SCHEMBL9370199 | 0.86 | MIF (0.33) | MIF | |
| SCHEMBL9364969 | 0.86 | MIF (0.33) | MIF | |
| SCHEMBL9365931 | 0.85 | MEN1 (0.34) | MIF | |
| SCHEMBL14163180 | 0.85 | MEN1 (0.34) | MIF |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11640114-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-02 | — | — | US | disclosed |
| US-11640114-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-02 | — | — | US | disclosed |
| US-20200326625-A1 | COMPOUND, RESIN, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-10-15 | — | — | US | disclosed |
| US-10747111-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-08-18 | — | — | US | disclosed |
| US-10670963-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-06-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200326625-A1 | COMPOUND, RESIN, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN | HAX1, BRIX1, RXRA | MIF 4838/4885NR1H2 372/4885HPGD 2482/4885 |
| US-10747111-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | HAX1, BRIX1, RXRA | MIF 4838/4885NR1H2 372/4885HPGD 2482/4885 |
| US-10670963-B2 | Salt and photoresist composition containing the same | HAX1, BRIX1, RER1 | MIF 4840/4885NR1H2 238/4885HPGD 3903/4885 |
| US-11640114-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | HAX1, BRIX1, RXRA | MIF 4838/4885NR1H2 372/4885HPGD 2482/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.