Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | TSHR | P16473 | 3/20 | 0.33 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.31 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.31 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.30 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.30 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.30 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1961330 | 0.97 | ALDH1A1 (0.35) | ALDH1A1THRBMEN1KMT2ATSHR | |
| SCHEMBL23493969 | 0.87 | CA1 (0.38) | ALDH1A1THRBMEN1KMT2ATSHR | |
| SCHEMBL10524835 | 0.83 | ALDH1A1 (0.42) | ALDH1A1THRBMEN1KMT2ATSHR | |
| SCHEMBL19558008 | 0.82 | CHRM2 (0.43) | ALDH1A1MEN1KMT2AAPOBEC3AAPOBEC3G | |
| SCHEMBL31184214 | 0.80 | TSHR (0.41) | ALDH1A1MEN1KMT2ATSHR | |
| SCHEMBL733116 | 0.79 | ALDH1A1 (0.42) | ALDH1A1THRBKMT2ATSHRCHRM2 | |
| SCHEMBL27715801 | 0.79 | ALDH1A1 (0.33) | ALDH1A1THRBTSHR | |
| SCHEMBL10645650 | 0.79 | ALDH1A1 (0.34) | ALDH1A1MEN1KMT2AAPOBEC3AAPOBEC3G | |
| SCHEMBL17802263 | 0.78 | CHRM2 (0.40) | ALDH1A1MEN1KMT2AAPOBEC3AAPOBEC3G | |
| SCHEMBL20838335 | 0.78 | ALDH1A1 (0.38) | ALDH1A1TSHRCHRM2CHRM4CHRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20110177454-A1 | RESIST MATERIAL AND PATTERN FORMATION METHOD USING THE RESIST MATERIAL | PANASONIC CORPORATION (JP) | 2011-07-21 | — | — | US | claimed |
| CN-112980543-B | High viscosity index comb polymer viscosity modifiers and methods of using the same to alter lubricant viscosity | 英菲诺姆国际有限公司 | 2023-12-19 | — | — | CN | disclosed |
| CN-112980549-B | High viscosity index comb polymer viscosity modifiers and methods of using the same to alter lubricant viscosity | 英菲诺姆国际有限公司 | 2023-12-15 | — | — | CN | disclosed |
| EP-3839018-B1 | HIGH VISCOSITY INDEX COMB POLYMER VISCOSITY MODIFIERS AND METHODS OF MODIFYING LUBRICANT VISCOSITY USING SAME | INFINEUM INT LTD (GB) | 2023-10-18 | — | — | EP | disclosed |
| EP-3839019-B1 | HIGH VISCOSITY INDEX COMB POLYMER VISCOSITY MODIFIERS AND METHODS OF MODIFYING LUBRICANT VISCOSITY USING SAME | INFINEUM INT LTD (GB) | 2023-08-02 | — | — | EP | disclosed |
| US-11685874-B2 | High viscosity index comb polymer viscosity modifiers and methods of modifying lubricant viscosity using same | INFINEUM INTERNATIONAL LIMITED (GB) | 2023-06-27 | — | — | US | disclosed |
| US-11384311-B2 | High viscosity index comb polymer viscosity modifiers and methods of modifying lubricant viscosity using same | INFINEUM INTERNATIONAL LIMITED (GB) | 2022-07-12 | — | — | US | disclosed |
| US-11365273-B2 | High viscosity index comb polymer viscosity modifiers and methods of modifying lubricant viscosity using same | INFINEUM INTERNATIONAL LIMITED (GB) | 2022-06-21 | — | — | US | disclosed |
| US-20220169947-A1 | High Viscosity Index Comb Polymer Viscosity Modifiers and Methods of Modifying Lubricant Viscosity Using Same | INFINEUM INTERNATIONAL LIMITED (GB) | 2022-06-02 | — | — | US | disclosed |
| US-20210189281-A1 | High Viscosity Index Comb Polymer Viscosity Modifiers and Methods of Modifying Lubricant Viscosity Using Same | lnfineum International Limited (GB) | 2021-06-24 | — | — | US | disclosed |
| US-20150277225-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM FORMED USING SAID COMPOSITION, METHOD FOR FORMING PATTERN USING SAID COMPOSITION, PROCESS FOR PRODUCING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-10-01 | — | — | US | disclosed |
| EP-2895468-A2 | DEVELOPABLE BOTTOM ANTI-REFLECTIVE COATING | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2015-07-22 | — | — | EP | disclosed |
| US-8900797-B2 | Developable bottom anti-reflective coating | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2014-12-02 | — | — | US | disclosed |
| CN-103998987-A | Composition for forming a developable bottom anti-reflective coating | AZ ELECTRONIC MATERIALS IP JAPAN K K | 2014-08-20 | — | — | CN | disclosed |
| US-20140193753-A1 | COMPOSITION FOR FORMING A DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2014-07-10 | — | — | US | disclosed |
| US-8697336-B2 | Composition for forming a developable bottom antireflective coating | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2014-04-15 | — | — | US | disclosed |
| US-20140087311-A1 | DEVELOPABLE BOTTOM ANTI-REFLECTIVE COATING | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) | 2014-03-27 | — | — | US | disclosed |
| US-20130157196-A1 | COMPOSITION FOR FORMING A DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2013-06-20 | — | — | US | disclosed |
| WO-2013089277-A1 | COMPOSITION FOR FORMING A DEVELOPABLE BOTTOM ANTI-REFLECTIVE COATING | AZ ELECTRONIC MATERIALS IP (JAPAN) K.K. (JP) | 2013-06-20 | — | — | WO | disclosed |
| US-20110177454-A1 | RESIST MATERIAL AND PATTERN FORMATION METHOD USING THE RESIST MATERIAL | PANASONIC CORPORATION (JP) | 2011-07-21 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20150277225-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM FORMED USING SAID COMPOSITION, METHOD FOR FORMING PATTERN USING SAID COMPOSITION, PROCESS FOR PRODUCING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | TERB1, ACTR5, ADPRS | ALDH1A1 2080/4885THRB 3690/4885MEN1 3840/4885 |
| US-20140087311-A1 | DEVELOPABLE BOTTOM ANTI-REFLECTIVE COATING | ALKBH5, METTL14, SETD7 | ALDH1A1 2125/4885THRB 4498/4885MEN1 2229/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.