Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.56 |
| ▸ | ALOX15 | P16050 | 6/20 | 0.56 |
| ▸ | SMN1; SMN2 | Q16637 | 5/20 | 0.56 |
| ▸ | CYP1A2 | P05177 | 4/20 | 0.56 |
| ▸ | MAPT | P10636 | 3/20 | 0.56 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.56 |
| ▸ | ATP2A2 | P16615 | 1/20 | 0.56 |
| ▸ | ATP2A3 | Q93084 | 1/20 | 0.56 |
| ▸ | CA2 | P00918 | 4/20 | 0.50 |
| ▸ | TYR | P14679 | 2/20 | 0.50 |
| ▸ | POLB | P06746 | 1/20 | 0.50 |
| ▸ | CA1 | P00915 | 2/20 | 0.46 |
| ▸ | CYP2C9 | P11712 | 5/20 | 0.45 |
| ▸ | CYP2C19 | P33261 | 4/20 | 0.45 |
| ▸ | TP53 | P04637 | 4/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 4/20 | 0.42 |
| ▸ | LMNA | P02545 | 3/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.42 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.41 |
| ▸ | MIF | P14174 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL224431 | 0.86 | ALOX15 (0.44) | ALDH1A1ALOX15SMN1; SMN2CYP1A2MAPT | |
| SCHEMBL8656911 | 0.86 | ALDH1A1 (0.56) | ALDH1A1ALOX15SMN1; SMN2CYP1A2MAPT | |
| SCHEMBL3625717 | 0.86 | ALOX15 (0.44) | ALDH1A1ALOX15SMN1; SMN2CYP1A2MAPT | |
| SCHEMBL16383545 | 0.83 | SMN1; SMN2 (0.58) | ALDH1A1ALOX15SMN1; SMN2CYP1A2MAPT | |
| SCHEMBL15038850 | 0.82 | SMN1; SMN2 (0.56) | ALDH1A1ALOX15SMN1; SMN2CYP1A2MAPT | |
| SCHEMBL10707367 | 0.82 | SMN1; SMN2 (0.52) | ALDH1A1ALOX15SMN1; SMN2CYP1A2MAPT | |
| SCHEMBL19193402 | 0.80 | ALDH1A1 (0.62) | ALDH1A1ALOX15SMN1; SMN2CYP1A2MAPT | |
| SCHEMBL5523835 | 0.79 | SMN1; SMN2 (0.38) | ALDH1A1ALOX15SMN1; SMN2CYP1A2MAPT | |
| SCHEMBL20132920 | 0.78 | ALOX15 (0.59) | ALDH1A1ALOX15SMN1; SMN2CYP1A2MAPT | |
| SCHEMBL5709989 | 0.77 | SHBG (0.38) | ALDH1A1ALOX15SMN1; SMN2CYP1A2MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 98 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112041739-B | Liquid crystal light modulation element | 日产化学株式会社 | 2024-06-11 | — | — | CN | disclosed |
| CN-118043733-A | Polymer dispersed liquid crystal element and method for manufacturing same | 日产化学株式会社 | 2024-05-14 | — | — | CN | disclosed |
| CN-117321493-A | Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal element | 日产化学株式会社 | 2023-12-29 | — | — | CN | disclosed |
| CN-117099040-A | Alignment film forming material, alignment film, and polymer-dispersed liquid crystal element | 日产化学株式会社 | 2023-11-21 | — | — | CN | disclosed |
| EP-2980058-B1 | COMPOSITION CONTAINING VINYL-GROUP-CONTAINING COMPOUND | TOKYO OHKA KOGYO CO LTD (JP) | 2023-05-03 | — | — | EP | disclosed |
| CN-115746874-A | Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element | 日产化学工业株式会社 | 2023-03-07 | — | — | CN | disclosed |
| WO-2023022155-A1 | POLYMER-DISPERSED LIQUID CRYSTAL ELEMENT AND METHOD FOR PRODUCING SAME | 日産化学株式会社 | 2023-02-23 | — | — | WO | disclosed |
| CN-111217946-B | Composition comprising a compound containing a vinyl group | 东京应化工业株式会社 | 2022-12-06 | — | — | CN | disclosed |
| WO-2022239658-A1 | LIQUID CRYSTAL ALIGNMENT AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL ELEMENT | 日産化学株式会社 | 2022-11-17 | — | — | WO | disclosed |
| CN-110023826-B | Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element | 日产化学株式会社 | 2022-10-25 | — | — | CN | disclosed |
| US-6083665-A | Photoresist laminate and method for patterning using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-07-04 | — | — | US | disclosed |
| EP-0768572-B1 | Photoresist composition | TOKYO OHKA KOGYO CO LTD (JP) | 1999-12-01 | — | — | EP | disclosed |
| US-5976760-A | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-11-02 | — | — | US | disclosed |
| US-5928837-A | Negative-working chemical-sensitization photoresist composition comprising oxime sulfonate compounds | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-07-27 | — | — | US | disclosed |
| US-5925495-A | Photoresist laminate and method for patterning using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-07-20 | — | — | US | disclosed |
| US-5800964-A | Photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-09-01 | — | — | US | disclosed |
| EP-0848289-A1 | Negative-working chemical sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-06-17 | — | — | EP | disclosed |
| EP-0821274-A1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-01-28 | — | — | EP | disclosed |
| US-5700625-A | Negative-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-12-23 | — | — | US | disclosed |
| EP-0768572-A1 | Photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-04-16 | — | — | EP | disclosed |