Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALOX15 | P16050 | 7/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 5/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.44 |
| ▸ | MAPT | P10636 | 2/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.44 |
| ▸ | ATP2A2 | P16615 | 1/20 | 0.44 |
| ▸ | ATP2A3 | Q93084 | 1/20 | 0.44 |
| ▸ | SELL | P14151 | 1/20 | 0.40 |
| ▸ | SELP | P16109 | 1/20 | 0.40 |
| ▸ | SELE | P16581 | 1/20 | 0.40 |
| ▸ | CA2 | P00918 | 4/20 | 0.39 |
| ▸ | TYR | P14679 | 2/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | ESR1 | P03372 | 1/20 | 0.37 |
| ▸ | CA1 | P00915 | 2/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 5/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 4/20 | 0.35 |
| ▸ | ACHE | P22303 | 1/20 | 0.35 |
| ▸ | HIF1A | Q16665 | 5/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2221169 | 0.86 | ALDH1A1 (0.56) | ALOX15ALDH1A1SMN1; SMN2CYP1A2MAPT | |
| SCHEMBL3625717 | 0.86 | ALOX15 (0.44) | ALOX15ALDH1A1SMN1; SMN2CYP1A2MAPT | |
| SCHEMBL5523835 | 0.79 | SMN1; SMN2 (0.38) | ALOX15ALDH1A1SMN1; SMN2CYP1A2MAPT | |
| SCHEMBL19765520 | 0.78 | ALDH1A1 (0.46) | ALOX15ALDH1A1SMN1; SMN2CYP1A2MAPT | |
| SCHEMBL5709989 | 0.77 | SHBG (0.38) | ALOX15ALDH1A1SMN1; SMN2CYP1A2MAPT | |
| SCHEMBL11143507 | 0.73 | SELL (0.33) | ALOX15ALDH1A1SMN1; SMN2CYP1A2MAPT | |
| SCHEMBL1176930 | 0.71 | CYP1A2 (0.45) | ALOX15ALDH1A1SMN1; SMN2CYP1A2MAPT | |
| SCHEMBL8656911 | 0.71 | ALDH1A1 (0.56) | ALOX15ALDH1A1SMN1; SMN2CYP1A2MAPT | |
| SCHEMBL2220478 | 0.71 | SELL (0.50) | ALOX15ALDH1A1SMN1; SMN2CYP1A2MAPT | |
| SCHEMBL19193402 | 0.70 | ALDH1A1 (0.62) | ALOX15ALDH1A1SMN1; SMN2CYP1A2MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 216 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11520083-B2 | Member, imaging apparatus, and method for producing member | CANON KABUSHIKI KAISHA (JP) | 2022-12-06 | — | — | US | claimed |
| US-4387152-A | Light-sensitive mixture and copying material prepared therefrom, and process for the preparation of a printing form from the copying material | HOECHST AKTIENGESELLSCHAFT (DE) | 1983-06-07 | — | — | US | claimed |
| US-12638772-B2 | Resist underlayer film-forming composition | NISSAN CHEMICAL CORPORATION (JP) | 2026-05-26 | — | — | US | disclosed |
| WO-2026105628-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | 日産化学株式会社 | 2026-05-21 | — | — | WO | disclosed |
| WO-2026105630-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | 日産化学株式会社 | 2026-05-21 | — | — | WO | disclosed |
| WO-2026100662-A1 | LIQUID CRYSTAL ALIGNING AGENT AND LIQUID CRYSTAL DISPLAY ELEMENT | 日産化学株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-20260118765-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| US-12601972-B2 | Resist underlayer film-forming composition with suppressed degeneration of crosslinking agent | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-14 | — | — | US | disclosed |
| US-20260062580-A1 | REVERSIBLY THERMOCHROMIC COMPOSITION, REVERSIBLY THERMOCHROMIC MICROCAPSULE PIGMENT ENCAPSULATING REVERSIBLY THERMOCHROMIC COMPOSITION, AND WRITING INSTRUMENT USING REVERSIBLY THERMOCHROMIC MICROCAPSULE PIGMENT | THE PILOT INK CO., LTD. (JP) | 2026-03-05 | — | — | US | disclosed |
| EP-4692943-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION | Nissan Chemical Corporation (JP) | 2026-02-11 | — | — | EP | disclosed |
| US-20260022203-A1 | SELF-CROSSLINKABLE POLYMER AND RESIST UNDERLAYER FILM FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2026-01-22 | — | — | US | disclosed |
| US-5008175-A | Copying materials | HOECHST CELANESE CORPORATION (US) | 1991-04-16 | — | — | US | disclosed |
| EP-0111273-B1 | LIGHT-SENSITIVE COMPOSITION, PHOTOPRINTING MATERIAL PREPARED USING THAT COMPOSITION AND PROCESSES FOR PRODUCING A PRINTING PLATE WITH THIS MATERIAL | HOECHST AKTIENGESELLSCHAFT (DE) | 1987-03-04 | — | — | EP | disclosed |
| EP-0059250-B1 | LIGHT-SENSITIVE COMPOSITION AND COPYING MATERIAL PREPARED THEREFROM | HOECHST AKTIENGESELLSCHAFT (DE) | 1985-09-04 | — | — | EP | disclosed |
| EP-0050802-B1 | LIGHT-SENSITIVE COMPOSITION, LIGHT-SENSITIVE COPYING MATERIAL MADE THEREFROM, AND PROCESS FOR PRODUCING A PRINTING FORME FROM THIS MATERIAL | HOECHST AKTIENGESELLSCHAFT (DE) | 1985-04-10 | — | — | EP | disclosed |
| EP-0111273-A2 | Light-sensitive composition, photoprinting material prepared using that composition and processes for producing a printing plate with this material | HOECHST AKTIENGESELLSCHAFT (DE) | 1984-06-20 | — | — | EP | disclosed |
| US-4404272-A | Light-sensitive mixture and copying material prepared therefrom with novolak having brominated phenol units | HOECHST AKTIENGESELLSCHAFT (DE) | 1983-09-13 | — | — | US | disclosed |
| US-4387152-A | Light-sensitive mixture and copying material prepared therefrom, and process for the preparation of a printing form from the copying material | HOECHST AKTIENGESELLSCHAFT (DE) | 1983-06-07 | — | — | US | disclosed |
| EP-0059250-A1 | Light-sensitive composition and copying material prepared therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1982-09-08 | — | — | EP | disclosed |
| EP-0050802-A2 | Light-sensitive composition, light-sensitive copying material made therefrom, and process for producing a printing forme from this material | HOECHST AKTIENGESELLSCHAFT (DE) | 1982-05-05 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260118765-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION | ASH2L, ASIC1, RPA1 | ALOX15 1956/4885ALDH1A1 1704/4885SMN1; SMN2 2238/4885 |
| US-12638772-B2 | Resist underlayer film-forming composition | RFC2, RFC1, RFC4 | ALOX15 1164/4885ALDH1A1 2183/4885SMN1; SMN2 1843/4885 |
| US-20260062580-A1 | REVERSIBLY THERMOCHROMIC COMPOSITION, REVERSIBLY THERMOCHROMIC MICROCAPSULE PIGMENT ENCAPSULATING REVERSIBLY THERMOCHROMIC COMPOSITION, AND WRITING INSTRUMENT USING REVERSIBLY THERMOCHROMIC MICROCAPSULE PIGMENT | TYR, SCO2, HBB | ALOX15 521/4885ALDH1A1 3835/4885SMN1; SMN2 2298/4885 |
| US-20260022203-A1 | SELF-CROSSLINKABLE POLYMER AND RESIST UNDERLAYER FILM FORMING COMPOSITION | SMC2, SMC4, SMC3 | ALOX15 3745/4885ALDH1A1 2303/4885SMN1; SMN2 1290/4885 |
| US-12601972-B2 | Resist underlayer film-forming composition with suppressed degeneration of crosslinking agent | BHMT, AADAT, PNMT | ALOX15 1285/4885ALDH1A1 1396/4885SMN1; SMN2 574/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.