SCHEMBL2221245

SCHEMBL2221245

CCC1(COCCCCCO)COC1

nearest known ligand 0.39

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
THRB P10828 1/20 0.36
HTT P42858 1/20 0.36
MAPT P10636 1/20 0.36
EPHX1 P07099 1/20 0.32
TSHR P16473 3/20 0.32
LMNA P02545 2/20 0.31
ALDH1A1 P00352 1/20 0.31
HSD17B10 Q99714 1/20 0.31
CYP4F2 P78329 1/20 0.31
CYP4A11 Q02928 1/20 0.31
GAA P10253 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3003545 1.00 MEN1 (0.36) MEN1KMT2ATHRBHTTMAPT
SCHEMBL822546 0.98 EPHX1 (0.33) MEN1KMT2ATHRBHTTMAPT
SCHEMBL2223475 0.93 EPHX1 (0.34) MEN1KMT2ATHRBHTTMAPT
SCHEMBL12677034 0.91 ALDH1A1 (0.33) TSHRALDH1A1
SCHEMBL1594114 0.91 ALDH1A1 (0.33) TSHRALDH1A1
SCHEMBL1582321 0.91 ALDH1A1 (0.33) TSHRALDH1A1
SCHEMBL7087398 0.91 ALDH1A1 (0.33) TSHRALDH1A1
SCHEMBL14655776 0.91 ALDH1A1 (0.33) TSHRALDH1A1
SCHEMBL213891 0.91 ALDH1A1 (0.33) TSHRALDH1A1
SCHEMBL214950 0.91 ALDH1A1 (0.33) TSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 157 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8293448-B2 Resin composition for stereolithography CMET INC. (JP) 2012-10-23 US claimed
US-12624247-B2 Film LG CHEM, LTD. (KR) 2026-05-12 US disclosed
EP-3433086-B1 ENERGETIC MATERIALS TNO (NL) 2026-05-06 EP disclosed
EP-3787878-B1 METHODS OF POST-PROCESSING PHOTOFABRICATED ARTICLES CREATED VIA ADDITIVE FABRICATION STRATASYS INC (US) 2026-02-18 EP disclosed
EP-3917445-B1 METHODS OF MAKING AND POSTPROCESSING ORTHODONTIC ARTICLES SOLVENTUM INTELLECTUAL PROPERTIES COMPANY (US) 2025-11-05 EP disclosed
US-20250306464-A1 COMPOSITION FOR FORMING FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, MONOMER, AND POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-10-02 US disclosed
EP-4625045-A2 COMPOSITION FOR FORMING FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, MONOMER, AND POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-10-01 EP disclosed
US-12378425-B2 Thermosetting compositions and forming three-dimensional objects therefrom STRATASYS, INC. (US) 2025-08-05 US disclosed
EP-2868692-B2 Stabilized matrix-filled liquid radiation curable resin compositions for additive fabrication STRATASYS INC (US) 2025-07-16 EP disclosed
WO-2025132333-A1 CURABLE COMPOSITIONS INCLUDING A POLYESTER (METH)ACRYLATE OLIGOMER ARKEMA FRANCE (FR) 2025-06-26 WO disclosed
US-8247583-B2 3-ethyloxethane compound having hydroxyl group and method for producing the same UBE INDUSTRIES, LTD. (JP) 2012-08-21 US disclosed
EP-2396299-A1 LIQUID RADIATION CURABLE RESINS FOR ADDITIVE FABRICATION COMPRISING A TRIARYL SULFONIUM BORATE CATIONIC PHOTOINITIATOR DSM IP Assets B.V. (NL) 2011-12-21 EP disclosed
WO-2011091228-A1 LIQUID RADIATION CURABLE RESINS CAPABLE OF CURING INTO LAYERS WITH SELECTIVE VISUAL EFFECTS AND METHODS FOR THE USE THEREOF DSM IP ASSETS B.V. (NL) 2011-07-28 WO disclosed
WO-2011084578-A1 SUBSTRATE-BASED ADDITIVE FABRICATION PROCESS DSM IP ASSETS, B.V. (NL) 2011-07-14 WO disclosed
WO-2011075553-A1 LIQUID RADIATION CURABLE RESINS FOR ADDITIVE FABRICATION COMPRISING A TRIARYL SULFONIUM BORATE CATIONIC PHOTOINITIATOR DSM IP ASSETS, B.V. (NL) 2011-06-23 WO disclosed
WO-2011075555-A1 LED CURABLE LIQUID RESIN COMPOSITIONS FOR ADDITIVE FABRICATION DSM IP ASSETS, B.V. (NL) 2011-06-23 WO disclosed
US-20100174098-A1 3-ETHYLOXETHANE COMPOUND HAVING HYDROXYL GROUP AND METHOD FOR PRODUCING THE SAME UBE INDUSTRIES, LTD. (JP) 2010-07-08 US disclosed
US-20090209674-A1 RESIN COMPOSITION FOR STEREOLITHOGRAPHY CMET INC. (JP) 2009-08-20 US disclosed
EP-2033982-A1 RESIN COMPOSITION FOR STEREOLITHOGRAPHY Cmet Inc. (JP) 2009-03-11 EP disclosed
EP-2030972-A1 3-ETHYLOXETHANE COMPOUND HAVING HYDROXYL GROUP AND METHOD FOR PRODUCING THE SAME Ube Industries, Ltd. (JP) 2009-03-04 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12624247-B2 Film RAD51, COL2A1, COL1A1 MEN1 2777/4885KMT2A 3180/4885THRB 441/4885
US-20100174098-A1 3-ETHYLOXETHANE COMPOUND HAVING HYDROXYL GROUP AND METHOD FOR PRODUCING THE SAME CYP2E1, CYP11B2, EGLN3 MEN1 2026/4885KMT2A 3503/4885THRB 2520/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.