Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA4 | P22748 | 2/20 | 0.41 |
| ▸ | CA12 | O43570 | 1/20 | 0.36 |
| ▸ | CA1 | P00915 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.36 |
| ▸ | CA7 | P43166 | 1/20 | 0.36 |
| ▸ | CA9 | Q16790 | 1/20 | 0.36 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.35 |
| ▸ | LTA4H | P09960 | 3/20 | 0.35 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.35 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 4/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.33 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.33 |
| ▸ | ACHE | P22303 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL107584 | 0.67 | ALDH1A1 (0.42) | ALDH1A1TDP1PTGS1TSHRLMNA | |
| SCHEMBL1628636 | 0.67 | KEAP1 (0.37) | CA4CA12CA1CA2CA7 | |
| SCHEMBL103512 | 0.65 | — | — | |
| SCHEMBL105150 | 0.65 | F2 (0.37) | CA4CA12CA1CA2CA7 | |
| SCHEMBL110040 | 0.65 | ALDH1A1 (0.36) | ALDH1A1TDP1MAPK1LMNATRPA1 | |
| SCHEMBL108908 | 0.65 | LTA4H (0.33) | CA4LTA4HTSHR | |
| SCHEMBL7047121 | 0.63 | ALDH1A1 (0.40) | CA4CA12CA1CA2CA7 | |
| Water SCHEMBL11745765 | 0.63 | TSHR (0.37) | CA4CA12CA1CA2CA7 | |
| Water SCHEMBL11743887 | 0.63 | TSHR (0.37) | CA4CA12CA1CA2CA7 | |
| Aniline SCHEMBL28119117 | 0.63 | TSHR (0.73) | CA4ALDH1A1TDP1ADRA2BPTGS1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 150 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250377591-A1 | PHOTORESIST COMPOSITION AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE | SAMSUNG ELECTRONICS CO LTD (KR) | 2025-12-11 | — | — | US | claimed |
| CN-119923600-A | Chemically amplified positive resist composition for improving pattern profile and enhancing adhesion | YC化学制品株式会社 | 2025-05-02 | — | — | CN | claimed |
| CN-112313580-B | Chemical amplification type positive photoresist composition for improving pattern profile | 荣昌化学制品株式会社 | 2024-11-22 | — | — | CN | claimed |
| CN-117795418-A | Chemically amplified positive resist composition for pattern profile and resolution improvement | YC化学制品株式会社 | 2024-03-29 | — | — | CN | claimed |
| US-7045267-B2 | Resist composition comprising photosensitive polymer having lactone in its backbone | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-05-16 | — | — | US | claimed |
| US-6962768-B2 | Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-11-08 | — | — | US | claimed |
| US-6897005-B2 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | SAMSUNG ELECTRONICS, CO., LTD. (KR) | 2005-05-24 | — | — | US | claimed |
| US-6787287-B2 | LITHOGRAPHY CHARACTERISTICS WHEN USED AS PHOTORESIST MATERIAL | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-09-07 | — | — | US | claimed |
| US-20040170919-A1 | Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same | SAMSUNG ELECTRONICS CO. LTD. (KR) | 2004-09-02 | — | — | US | claimed |
| US-20040137363-A1 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | CHOI SANG-JUN (KR) | 2004-07-15 | — | — | US | claimed |
| US-6696217-B2 | ACRYLATED ESTER POLYMER | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-02-24 | — | — | US | claimed |
| US-20040018442-A1 | Resist composition comprising photosensitive polymer having lactone in its backbone | YOON KWANG-SUB (KR) | 2004-01-29 | — | — | US | claimed |
| US-6673513-B2 | COPOLYMER OF MALEIC ANHYDRIDE AND ALKYL VINYL ETHER OR UNSATURATED OXYGEN CONTAINING RINGS SUCH AS 3,4-DIHYDRO-2H-PYRAN, AND TERPOLYMERS WITH ACRYLATE HAVING ACID LABILE HYDROCARBON GROUP; ETCH RESISTANCE, GOOD ADHESION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-01-06 | — | — | US | claimed |
| US-6596459-B1 | Photosensitive polymer having a main chain consisting of only norbornene-type alicyclic units | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-07-22 | — | — | US | claimed |
| US-6537727-B2 | Improved dry etching resistance, adhesiveness to underlying material layers, line edge roughness of line patterns, contrast characteristics | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-03-25 | — | — | US | claimed |
| US-20020160303-A1 | Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-10-31 | — | — | US | claimed |
| US-20020155379-A1 | Photosensitive monomer, photosensitive polymer and chemically amplified resist composition comprising lactone group having acid-labile protecting group | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-10-24 | — | — | US | claimed |
| US-20020146642-A1 | Photosensitive polymers and resist compositions comprising the photosensitive polymers | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-10-10 | — | — | US | claimed |
| US-20020042016-A1 | Resist composition comprising photosensitive polymer having loctone in its backbone | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-04-11 | — | — | US | claimed |
| US-20010024763-A1 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2001-09-27 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20040170919-A1 | Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same | EEF1D, MACF1, YTHDF2 | CA4 3615/4885CA12 4578/4885CA1 4431/4885 |
| US-20020160303-A1 | Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same | PAH, SUV39H1, SUV39H2 | CA4 1725/4885CA12 4348/4885CA1 4774/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.