Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.59 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.50 |
| ▸ | ELANE | P08246 | 6/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
| ▸ | HPGD | P15428 | 3/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.40 |
| ▸ | USP2 | O75604 | 1/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.40 |
| ▸ | ESR1 | P03372 | 2/20 | 0.38 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | AKR1C3 | P42330 | 4/20 | 0.37 |
| ▸ | AKR1C2 | P52895 | 4/20 | 0.37 |
| ▸ | ITGB3 | P05106 | 1/20 | 0.37 |
| ▸ | ITGA2B | P08514 | 1/20 | 0.37 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | GGT1 | P19440 | 1/20 | 0.37 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22279462 | 0.83 | ALDH1A1 (0.49) | KDM4EALDH1A1KMT2AAKR1C3AKR1C2 | |
| SCHEMBL22279456 | 0.83 | ALDH1A1 (0.49) | KDM4EALDH1A1ELANEMAPTKMT2A | |
| SCHEMBL22279610 | 0.79 | CA12 (0.35) | KDM4EALDH1A1ELANEMAPK1HPGD | |
| SCHEMBL22374224 | 0.79 | KDM4E (0.62) | KDM4EALDH1A1MAPTMAPK1HPGD | |
| SCHEMBL22986758 | 0.78 | ELANE (0.37) | KDM4EALDH1A1ELANETDP1 | |
| SCHEMBL22279463 | 0.75 | ALDH1A1 (0.36) | KDM4EALDH1A1MAPTMAPK1HPGD | |
| SCHEMBL22279461 | 0.75 | KMT2A (0.56) | ALDH1A1ELANEMAPTMAPK1HSD17B10 | |
| SCHEMBL5603081 | 0.75 | KDM4E (1.00) | KDM4EALDH1A1ELANEMAPTMAPK1 | |
| SCHEMBL17908039 | 0.75 | ALDH1A1 (0.73) | KDM4EALDH1A1KMT2A | |
| SCHEMBL22279611 | 0.74 | KDM4E (0.58) | KDM4EALDH1A1ELANEMAPTMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11720020-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-08 | — | — | US | disclosed |
| US-11586110-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-02-21 | — | — | US | disclosed |
| US-11415887-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-08-16 | — | — | US | disclosed |
| US-20210033971-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-02-04 | — | — | US | disclosed |
| US-20210033969-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-02-04 | — | — | US | disclosed |
| US-20210033970-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-02-04 | — | — | US | disclosed |
| US-20200272048-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-08-27 | — | — | US | disclosed |
| US-20200241414-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-30 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200241414-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | INSR, HNRNPU, HNRNPR | KDM4E 2213/4885ALDH1A1 4836/4885ELANE 2178/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.